High rate growth of device-grade microcrystalline silicon films at 8nm/s

2006 ◽  
Vol 90 (18-19) ◽  
pp. 3223-3231 ◽  
Author(s):  
Chisato Niikura ◽  
Michio Kondo ◽  
Akihisa Matsuda
Keyword(s):  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High rate growth highly crystallized microcrystalline silicon films using SiH4/H2 high-density microwave plasma

2007 ◽  
Vol 515 (9) ◽  
pp. 4098-4104 ◽  
Author(s):  
Jhantu K. Saha ◽  
Haijun Jia ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

2004 ◽  
Vol 457 (1) ◽  
pp. 84-89 ◽  
Author(s):  
Chisato Niikura ◽  
Naho Itagaki ◽  
Michio Kondo ◽  
Yoshinobu Kawai ◽  
Akihisa Matsuda
Keyword(s):  
Glow Discharge ◽  
Discharge Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Glow Discharge Plasma ◽  
Microcrystalline Silicon

Influence of the total gas flow rate on high rate growth microcrystalline silicon films and solar cells

2009 ◽  
Vol 18 (8) ◽  
pp. 3563-3567 ◽  
Author(s):  
Han Xiao-Yan ◽  
Hou Guo-Fu ◽  
Zhang Xiao-Dan ◽  
Wei Chang-Chun ◽  
Li Gui-Jun ◽  
...  
Keyword(s):  
Solar Cells ◽  
Flow Rate ◽  
Gas Flow ◽  
Silicon Films ◽  
High Rate ◽  
Gas Flow Rate ◽  
Microcrystalline Silicon

High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma

2007 ◽  
Vol 515 (17) ◽  
pp. 6713-6720 ◽  
Author(s):  
Haijun Jia ◽  
Jhantu K. Saha ◽  
Naoyuki Ohse ◽  
Hajime Shirai
Keyword(s):  
Microwave Plasma ◽  
High Density ◽  
Silicon Films ◽  
High Rate ◽  
Microcrystalline Silicon
Sign in / Sign up

Export Citation Format

Share Document