Development of cloud-based automatic virtual metrology system for semiconductor industry

2015 ◽  
Vol 34 ◽  
pp. 30-43 ◽  
Author(s):  
Hsien-Cheng Huang ◽  
Yu-Chuan Lin ◽  
Min-Hsiung Hung ◽  
Chia-Chun Tu ◽  
Fan-Tien Cheng
Keyword(s):  
Semiconductor Industry ◽  
Virtual Metrology ◽  
Metrology System

A novel automatic virtual metrology system architecture for TFT-LCD industry based on main memory database

2012 ◽  
Vol 28 (4) ◽  
pp. 559-568 ◽  
Author(s):  
Min-Hsiung Hung ◽  
Wen-Huang Tsai ◽  
Haw-Ching Yang ◽  
Yi-Jhong Kao ◽  
Fan-Tien Cheng
Keyword(s):  
System Architecture ◽  
Main Memory ◽  
Virtual Metrology ◽  
Main Memory Database ◽  
Metrology System

Approaching an absolute with SEM metrology

1993 ◽  
Vol 51 ◽  
pp. 780-781
Author(s):  
George H. McAfee
Keyword(s):  
Semiconductor Industry ◽  
Measurement Standard ◽  
Cross Sectional ◽  
System Calibration ◽  
System A ◽  
Cursor Position ◽  
Certified Value ◽  
Metrology System ◽  
Selection Of ◽  
Scanning Electron

The Scanning Electron Microscope remains one of the most universal tools in the semiconductor industry. While it gained prominence in the areas of inspection and analysis, it is also a very capable metrology tool. There is a wide selection of S.E.M.′s available that are dedicated to line width measuring; however, this article discusses film thickness measuring during cross-sectional S.E.M. analysis.As with any metrology system, a process should begin with a certified and traceable measurement standard. N.I.S.T. SRM 484f was the standard employed for this experiment. A gauge and capability study was first performed on a Nanometrics CWIKSCAN II FE S.E.M.. Long range repeatability was calculated at 1.57% Figures 1 and 2 show the micrograph and video signal data respectively from the N.I.S.T. standard. Note the cursor position and measurement value on figure 2. The 1.072μm value agrees very well with the certified value of 1.067μm.• It is important to note that the aspect ratio on most CRT screens is not 1:1. Therefore, if any electronic manipulation of the image is required for cursor alignment, the system calibration must be performed at the same orientation where the measurements will be taken.

A virtual metrology system for semiconductor manufacturing

2009 ◽  
Vol 36 (10) ◽  
pp. 12554-12561 ◽  
Author(s):  
Pilsung Kang ◽  
Hyoung-joo Lee ◽  
Sungzoon Cho ◽  
Dongil Kim ◽  
Jinwoo Park ◽  
...  
Keyword(s):  
Semiconductor Manufacturing ◽  
Virtual Metrology ◽  
Metrology System
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