scholarly journals A Proposal of Transaction Processing Method for MongoDB

2016 ◽  
Vol 96 ◽  
pp. 801-810 ◽  
Author(s):  
Tsukasa Kudo ◽  
Masahiko Ishino ◽  
Kenji Saotome ◽  
Nobuhiro Kataoka
Keyword(s):  
Transaction Processing ◽  
Processing Method

Research on Malicious Transaction Processing Method of Database System

2008 ◽  
Author(s):  
Chi Chen ◽  
Deng-guo Feng ◽  
Min Zhang ◽  
De-sheng Zhang ◽  
He-qun Xian
Keyword(s):  
Transaction Processing ◽  
Database System ◽  
Processing Method ◽  
Malicious Transaction

Low-temperature Mo-catalyzed growth of crystalline Si3N4 by CVD

1993 ◽  
Vol 51 ◽  
pp. 918-919
Author(s):  
K.L. More ◽  
R.A. Lowden ◽  
T.M. Besmann
Keyword(s):  
Vapor Deposition ◽  
Hot Isostatic Pressing ◽  
Chemical Vapor ◽  
Processing Method ◽  
Crystalline Material ◽  
Structural Ceramic ◽  
Alternative Processing ◽  
Strong Candidate ◽  
Hot Pressing Sintering ◽  
Processing Techniques

Silicon nitride possesses an attractive combination of thermo-mechanical properties which makes it a strong candidate material for many structural ceramic applications. Unfortunately, many of the conventional processing techniques used to produce Si3N4, such as hot-pressing, sintering, and hot-isostatic pressing, utilize significant amounts of densification aids (Y2O3, Al2O3, MgO, etc.) which ultimately lowers the utilization temperature to well below that of pure Si3N4 and also decreases the oxidation resistance. Chemical vapor deposition (CVD) is an alternative processing method for producing pure Si3N4. However, deposits made at temperatures less than ~1200°C are usually amorphous and at slightly higher temperatures, the deposition of crystalline material requires extremely low deposition rates (~5 μm/h). Niihara and Hirai deposited crystalline α-Si3N4 at 1400°C at a deposition rate of ~730 μm/h. Hirai and Hayashi successfully lowered the CVD temperature for the growth of crystalline Si3N4 by adding TiCl4 vapor to the SiCl4, NH3, and H2 reactants. This resulted in the growth of α-Si3N4 with small amounts of TiN at temperatures as low as 1250°C.

Crosstalk Minimization Method for Eye-tracking-based 3D Display

2020 ◽  
Author(s):  
Seok Lee ◽  
Juyong Park ◽  
Dongkyung Nam
Keyword(s):  
Image Processing ◽  
Eye Tracking ◽  
Three Dimensional ◽  
Processing Method ◽  
Eye Position ◽  
Relative Location ◽  
3D Display ◽  
Minimization Method ◽  
3D Crosstalk ◽  
Pixel Value

In this article, the authors present an image processing method to reduce three-dimensional (3D) crosstalk for eye-tracking-based 3D display. Specifically, they considered 3D pixel crosstalk and offset crosstalk and applied different approaches based on its characteristics. For 3D pixel crosstalk which depends on the viewer’s relative location, they proposed output pixel value weighting scheme based on viewer’s eye position, and for offset crosstalk they subtracted luminance of crosstalk components according to the measured display crosstalk level in advance. By simulations and experiments using the 3D display prototypes, the authors evaluated the effectiveness of proposed method.

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