scholarly journals Atomic Force Microscopy as a Valuable Tool in an Innovative Multi-scale and Multi-technique Non-invasive Approach to Surface Cleaning Monitoring

2013 ◽  
Vol 8 ◽  
pp. 258-268 ◽  
Author(s):  
C. Pereira ◽  
I.M.P.L.V.O. Ferreira ◽  
L.C. Branco ◽  
I.C.A. Sandu ◽  
T. Busani
2020 ◽  
Vol 11 (1) ◽  
Author(s):  
Francesca Zuttion ◽  
Adai Colom ◽  
Stefan Matile ◽  
Denes Farago ◽  
Frédérique Pompeo ◽  
...  

AbstractThe increase in speed of the high-speed atomic force microscopy (HS-AFM) compared to that of the conventional AFM made possible the first-ever visualisation at the molecular-level of the activity of an antimicrobial peptide on a membrane. We investigated the medically prescribed but poorly understood lipopeptide Daptomycin under infection-like conditions (37 °C, bacterial lipid composition and antibiotic concentrations). We confirmed so far hypothetical models: Dap oligomerization and the existence of half pores. Moreover, we detected unknown molecular mechanisms: new mechanisms to form toroidal pores or to resist Dap action, and to unprecedently quantify the energy profile of interacting oligomers. Finally, the biological and medical relevance of the findings was ensured by a multi-scale multi-nativeness—from the molecule to the cell—correlation of molecular-level information from living bacteria (Bacillus subtilis strains) to liquid-suspended vesicles and supported-membranes using electron and optical microscopies and the lipid tension probe FliptR, where we found that the cells with a healthier state of their cell wall show smaller membrane deformations.


2016 ◽  
Vol 110 (3) ◽  
pp. 594a
Author(s):  
Aiko Yoshida ◽  
Shuichi Ito ◽  
Masahiro Kumeta ◽  
Shige H. Yoshimura

1992 ◽  
Vol 259 ◽  
Author(s):  
I-Hsing Tan ◽  
Song Shi Stone ◽  
Craig Prater ◽  
Richard Mirin ◽  
Evelyn Hu ◽  
...  

ABSTRACTThe efficacy of residual photoresist removal on the top surface of the InGaAs QWW grating and the effects of surface oxides on the optical property of quantum well wires (QWWs) were examined through atomic force microscopy (AFM) and photoluminescence (PL) spectroscopy. Different resist removal treatments, including acetone, ozone and diluted HC1 were evaluated. Both AFM and PL measurements reveal that with the surface cleaning processing we have developed, high luminescence efficiency from the QWWs is conserved after removal of the residual photoresist.


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