Deposition of nanocrystalline CNx thin films on Co/Ni-covered substrate by nitrogen-atom-beam-assisted pulsed laser ablation

2004 ◽  
Vol 320 (4) ◽  
pp. 297-301 ◽  
Author(s):  
Ning Xu ◽  
Li Li ◽  
Hao Lin ◽  
Jiada Wu ◽  
Aiming Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Nitrogen Atom ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Atom Beam

Synthesis of carbon nitride nanocrystals on Co/Ni-covered substrate by nitrogen-atom-beam-assisted pulsed laser ablation

2003 ◽  
Vol 18 (11) ◽  
pp. 2552-2555 ◽  
Author(s):  
Ning Xu ◽  
Hao Lin ◽  
Li Li ◽  
Weijian Pan ◽  
Jian Sun ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Nitrogen Atom ◽  
Carbon Nitride ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Synthesis Process ◽  
X Ray Diffraction ◽  
Atom Beam ◽  
Transmission Electron ◽  
Deposited Films

Carbon nitride nanocrystals were synthesized on Co/Ni-covered Si(100) wafers using a nitrogen-atom-beam-assisted pulsed laser ablation deposition method. Transmission electron miscroscopy, x-ray diffraction, and Raman spectroscopy showed that as-deposited films were constructed primarily from nanometer-sized β-C3N4 and CNx crystallites. The co-catalyzation by the cobalt and nickel in the synthesis process is considered to play an important role in the formation of nanocrystalline β-C3N4. The reasons for the formation of carbon nitride nanocrystals were analyzed.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

ZnS thin films grown on Si(100) by XeCl pulsed laser ablation

2001 ◽  
Vol 177 (1-2) ◽  
pp. 73-77 ◽  
Author(s):  
K.T Hillie ◽  
C Curren ◽  
H.C Swart
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation

Nano-ionic thin films of gadolinia-doped ceria prepared by pulsed laser ablation

Ionics ◽  
2007 ◽  
Vol 13 (5) ◽  
pp. 343-348 ◽  
Author(s):  
P. Kuppusami ◽  
K. Muthukkumaran ◽  
R. Divakar ◽  
R. Kesavamoorthy ◽  
E. Mohandas ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Doped Ceria
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