Self-assembled GaAs/AlGaAs quantum dots by molecular beam epitaxy and in situ AsBr3 etching

2004 ◽  
Vol 23 (3-4) ◽  
pp. 384-389 ◽  
Author(s):  
A Rastelli ◽  
R Songmuang ◽  
O.G Schmidt
2005 ◽  
Vol 04 (02) ◽  
pp. 253-259 ◽  
Author(s):  
S. SURAPRAPAPICH ◽  
S. THAINOI ◽  
C. LALIEW ◽  
S. KANJANACHUCHAI ◽  
S. PANYAKEOW

Self-assembled InAs elongated nanostructures were fabricated by continuous processing steps, starting from self-assembling of quantum dots, thin capping over the quantum dots to induce an anisotropic strain field, and to anneal the quantum dots in the molecular-beam-epitaxy machine. In-situ RHEED observations at each processing step were studied and confirmed by ex-situ AFM images of the surface morphology. The elongated nanostructures were demonstrated tobe templates for chains of uniform quantum dots.


2001 ◽  
Vol 89 (7) ◽  
pp. 4186-4188 ◽  
Author(s):  
Y. F. Li ◽  
J. Z. Wang ◽  
X. L. Ye ◽  
B. Xu ◽  
F. Q. Liu ◽  
...  

2002 ◽  
Vol 722 ◽  
Author(s):  
S. Kiravittaya ◽  
R. Songmuang ◽  
O. G. Schmidt

AbstractEnsembles of homogeneous self-assembled quantum dots (QDs) and nanoholes are fabricated using molecular beam epitaxy in combination with atomically precise in situ etching. Self-assembled InAs QDs with height fluctuations of ±5% were grown using a very low indium growth rate on GaAs (001) substrate. If these dots are capped with GaAs at low temperature, strong room temperature emission at 1.3 νm with a linewidth of 21 meV from the islands is observed. Subsequently, we fabricate homogeneous arrays of nanoholes by in situ etching the GaAs surface of the capped InAs QDs with AsBr3. The depths of the nanoholes can be tuned over a range of 1-6 nm depending on the nominal etching depth and the initial capping layer thickness. We appoint the formation of nanoholes to a pronounced selectivity of the AsBr3 to local strain fields. The holes can be filled with InAs again such that an atomically flat surface is recovered. QDs in the second layer preferentially form at those sites, where the holes were initially created. Growth conditions for the second InAs layer can be chosen in such a way that lateral QD molecules form on a flat surface.


1996 ◽  
Vol 68 (7) ◽  
pp. 991-993 ◽  
Author(s):  
S. Fafard ◽  
Z. Wasilewski ◽  
J. McCaffrey ◽  
S. Raymond ◽  
S. Charbonneau

2000 ◽  
Vol 77 (6) ◽  
pp. 809-811 ◽  
Author(s):  
E. Martinez-Guerrero ◽  
C. Adelmann ◽  
F. Chabuel ◽  
J. Simon ◽  
N. T. Pelekanos ◽  
...  

2002 ◽  
Vol 242 (1-2) ◽  
pp. 109-115 ◽  
Author(s):  
Z.Z Sun ◽  
S.F Yoon ◽  
K.C Yew ◽  
W.K Loke ◽  
S.Z Wang ◽  
...  

2001 ◽  
Vol 227-228 ◽  
pp. 1121-1125 ◽  
Author(s):  
Nobuo Matsumura ◽  
Takashi Saito ◽  
Junji Saraie

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