Monte–Carlo simulation of the particle transport during physical vapor deposition of ceramic superconductors

2005 ◽  
Vol 425 (3-4) ◽  
pp. 101-110 ◽  
Author(s):  
E.K. Hollmann ◽  
V.A. Vol‘pyas ◽  
R. Wördenweber
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Vapor Deposition ◽  
Particle Transport ◽  
Physical Vapor Deposition ◽  
Ceramic Superconductors

Monte Carlo simulation of hyperthermal physical vapor deposition

2001 ◽  
Vol 49 (16) ◽  
pp. 3321-3332 ◽  
Author(s):  
Y.G Yang ◽  
X.W Zhou ◽  
R.A Johnson ◽  
H.N.G Wadley
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Vapor Deposition ◽  
Physical Vapor Deposition

Monte Carlo simulation of the influence of pressure and target–substrate distance on the sputtering process for metal and semiconductor layers

2016 ◽  
Vol 30 (20) ◽  
pp. 1650253 ◽  
Author(s):  
Abdelkader Bouazza ◽  
Abderrahmane Settaouti
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Close Relation ◽  
Gas Pressure ◽  
Substrate Distance ◽  
Good Agreement ◽  
Number Of Particles

The energy and the number of particles arriving at the substrate during physical vapor deposition (PVD) are in close relation with divers parameters. In this work, we present the influence of the distance between the target and substrate and the gas pressure in the sputtering process of deposited layers of metals (Cu, Al and Ag) and semiconductors (Ge, Te and Si) for substrate diameter of 40 cm and target diameter of 5 cm. The nascent sputter flux, the flux of the atoms and their energy arriving at the substrate have been simulated by Monte Carlo codes. A good agreement between previous works of other groups and our simulations for sputter pressures (0.3–1 Pa) and target–substrate distances (8–20 cm) is obtained.

A Monte Carlo simulation of the physical vapor deposition of nickel

1997 ◽  
Vol 45 (4) ◽  
pp. 1455-1468 ◽  
Author(s):  
Y.G. Yang ◽  
R.A. Johnson ◽  
H.N.G. Wadley
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Vapor Deposition ◽  
Physical Vapor Deposition
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