Optical properties of hydrophobic ZnO nano-structure based on antireflective coatings of ZnO/TiO/SiO thin films ‏

2020 ◽  
Vol 593 ◽  
pp. 412263 ◽  
Author(s):  
Ahmad A. Ahmad ◽  
Qais M. Al-Bataineh ◽  
Ahmad M. Alsaad ◽  
Tariq O. Samara ◽  
Kholoud A. Al-izzy
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Antireflective Coatings ◽  
Nano Structure

Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature

2010 ◽  
Vol 636-637 ◽  
pp. 991-995 ◽  
Author(s):  
Mabrouk Selmi ◽  
F. Chaabouni ◽  
Mohamed Abaab ◽  
Bahri Rezig
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Room Temperature ◽  
Rf Magnetron Sputtering ◽  
Antireflective Coatings ◽  
Rf Power ◽  
Si Substrates ◽  
Visible Wavelength Range ◽  
Aluminum Doped Zinc Oxide ◽  
Optical Applications

RF magnetron sputtering is used to deposit Aluminum-doped zinc oxide (ZnO:Al) films on glass and p-Si substrates. This work is a study of ZnO:Al films grown at different RF powers for photovoltaic cells application, as antireflective (AR) coatings. At room temperature and argon gas pressure of 0.6 Pa, RF power was changed from 200 to 400 W. The structural, electrical and optical properties of ZnO:Al films were investigated. Under theses conditions, we have obtained c axis-oriented wurtzite structure ZnO thin films with high transmission (>85%) and low reflection in visible wavelength range and a band gap of 3.34 eV. The results of this study suggest that the variation of the RF power, used for growth, allows the control of the structural and optical properties of the films. ZnO:Al films can be used in optical applications as thin films antireflective coatings.

Nano-structure and optical properties (plasmonic) of graded helical square tower-like (terraced) Mn sculptured thin films

2017 ◽  
Vol 393 ◽  
pp. 234-255 ◽  
Author(s):  
Hadi Savaloni ◽  
Mahsa Fakharpour ◽  
Araz Siabi-Garjan ◽  
Frank Placido ◽  
Ferydon Babaei
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Nano Structure ◽  
Sculptured Thin Films

Potential of TaOXNY Thin Films Deposited by Reactive Sputtering as Antireflective Coatings: Composition and Optical Properties

2011 ◽  
Vol 324 ◽  
pp. 73-76 ◽  
Author(s):  
Fadi Zoubian ◽  
Eric Tomasella ◽  
A. Bousquet ◽  
Thierry Sauvage ◽  
C. Eypert
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tantalum Nitride ◽  
Antireflective Coatings ◽  
Nitrogen Gas ◽  
Tantalum Target ◽  
Uv Visible ◽  
Reactive Gases ◽  
Nitrogen Flows ◽  
Pure Tantalum

Tantalum oxynitride thin films are deposited by radio-frequency magnetron sputtering using a pure tantalum target under argon/oxygen/nitrogen gas mixture. The argon flow is kept constant while the oxygen and nitrogen flows are changed simultaneously in a way to keep constant the total flow of these reactive gases. We succeed to deposit TaOxNyfilms with stoichiometry ranging between those of TaN and Ta2O5. All films are deposited at room temperature and are amorphous. Spectroscopic ellipsometry and UV-visible spectrometry investigations show a direct relation between the optical properties and the stoichiometry of the films. In particular, the results show a variation of the refractive index from pure tantalum nitride-like films (3.76) to tantalum pentoxyde-like films (2.1), which confirms the possibility to deposit graded antireflective coatings with tantalum oxynitride.

OPTICAL PROPERTIES OF THIN FILMS ON ROUGH SURFACES

1983 ◽  
Vol 44 (C10) ◽  
pp. C10-363-C10-366 ◽  
Author(s):  
J. Vlieger ◽  
M. M. Wind
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Rough Surfaces

Structural and Optical Properties of Cu2ZnSn(SxSe1–x)4 Thin Films

2018 ◽  
Vol 23 (3) ◽  
pp. 230-239
Author(s):  
E.P. Zaretskaya ◽  
◽  
V.F. Gremenok ◽  
A.V. Stanchik ◽  
A.N. Pyatlitski ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Structural And Optical Properties

Structural and optical properties of Tin Oxide and Indium doped SnO2 thin films deposited by thermal evaporation technique

2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tin Oxide ◽  
Thermal Evaporation ◽  
Pure Sno2 ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Evaporation Technique ◽  
Sno2 Thin Films

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.

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