First-principles studies of di-arsenic interstitial and its implications for arsenic-interstitial diffusion in crystalline silicon

2007 ◽  
Vol 401-402 ◽  
pp. 144-147 ◽  
Author(s):  
Yonghyun Kim ◽  
Taras A. Kirichenko ◽  
Ning Kong ◽  
Larry Larson ◽  
Sanjay K. Banerjee
2020 ◽  
Vol 46 (6) ◽  
pp. 8192-8199
Author(s):  
Ruijie Zhang ◽  
Shenggui Ma ◽  
Qingqing Wang ◽  
Chengjian Xiao ◽  
Chuanyu Zhang ◽  
...  

2008 ◽  
Vol 113 (3) ◽  
pp. 856-861 ◽  
Author(s):  
Zhenhai Wang ◽  
Mingwen Zhao ◽  
Tao He ◽  
Xuejuan Zhang ◽  
Zexiao Xi ◽  
...  

2012 ◽  
Vol 85 (4) ◽  
pp. 926-931
Author(s):  
O. I. Velichko ◽  
V. V. Aksenov ◽  
A. P. Kovaleva

2005 ◽  
Vol 864 ◽  
Author(s):  
Scott A. Harrison ◽  
Thomas F. Edgar ◽  
Gyeong S. Hwang

AbstractBased on first principles density functional theory calculations, we identify the structure and diffusion pathway for a fluorine-silicon interstitial complex (F-Sii). We find the F-Sii complex to be most stable in the singly positive charge state at all Fermi leVels. At mid-gap, the complex is found to have a binding energy of 1.08 eV relative to bond-centered F+ and (110)-split Sii. We find the F-Sii complex has an overall migration barrier of 0.76 eV, which suggests that this complex may play an important role in fluorine diffusion. Our results should lead to more accurate models that describe the behavior of fluorine co-implants crystalline silicon.


Author(s):  
S. Mirabella ◽  
D. De Salvador ◽  
E. Napolitani ◽  
F. Giannazzo ◽  
G. Impellizzeri ◽  
...  

RSC Advances ◽  
2015 ◽  
Vol 5 (23) ◽  
pp. 17438-17443 ◽  
Author(s):  
Jong-Hyun Seo ◽  
Chia-Yun Chou ◽  
Yu-Hao Tsai ◽  
Yigil Cho ◽  
Tae-Yeon Seong ◽  
...  

Through a combined density functional theory andin situscanning electron microscopy study, we demonstrate the ultrafast chemical lithiation of a singlec-Si nanowire brought into direct contact with Li metal in the absence of an electric field.


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