Dual-wavelength investigation of laser-induced damage in multilayer mirrors at 532 and 1064nm

2012 ◽  
Vol 285 (12) ◽  
pp. 2889-2896 ◽  
Author(s):  
Lei Yan ◽  
Chaoyang Wei ◽  
Dawei Li ◽  
Kui Yi ◽  
Zhengxiu Fan
2015 ◽  
Vol 55 (1) ◽  
pp. 104 ◽  
Author(s):  
Marius Mrohs ◽  
Lars Jensen ◽  
Stefan Günster ◽  
Thimotheus Alig ◽  
Detlev Ristau

2013 ◽  
Vol 53 (4) ◽  
pp. A62 ◽  
Author(s):  
Xinbin Cheng ◽  
Abudusalamu Tuniyazi ◽  
Jinlong Zhang ◽  
Tao Ding ◽  
Hongfei Jiao ◽  
...  

2016 ◽  
Vol 55 (22) ◽  
pp. 6108 ◽  
Author(s):  
Shuvendu Jena ◽  
Raj Bahadur Tokas ◽  
K. Divakar Rao ◽  
Sudhakar Thakur ◽  
Naba Kishore Sahoo

2009 ◽  
Vol 17 (22) ◽  
pp. 20313 ◽  
Author(s):  
Ming Zhou ◽  
Jianda Shao ◽  
Zhengxiu Fan ◽  
Yuan-An Zhao ◽  
Dawei Li

2011 ◽  
Vol 9 (9) ◽  
pp. 093102-93105 ◽  
Author(s):  
王营 Ying Wang ◽  
赵元安 Yuanan Zhao ◽  
邵建达 Jianda Shao ◽  
范正修 Zhengxiu Fan

Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.


Sign in / Sign up

Export Citation Format

Share Document