PDL free plasma enhanced chemical vapor deposition SiC optical waveguides and devices

2007 ◽  
Vol 269 (2) ◽  
pp. 338-345 ◽  
Author(s):  
G. Pandraud ◽  
P.M. Sarro ◽  
P.J. French
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Optical Waveguides ◽  
Chemical Vapor ◽  
Free Plasma

Selective Area Epitaxy of GaAs Optical Waveguides by Laser Assisted Chemical Vapor Deposition

1995 ◽  
Vol 397 ◽  
Author(s):  
J.C. Roberts ◽  
K.S. Boutros ◽  
S.M. Bedair
Keyword(s):  
Chemical Vapor Deposition ◽  
Integrated Circuits ◽  
Cross Sections ◽  
Vapor Deposition ◽  
Optical Waveguides ◽  
Chemical Vapor ◽  
Direct Writing ◽  
Selective Area Epitaxy ◽  
Selective Area ◽  
Multimode Waveguides

ABSTRACTDirect writing of GaAs optical waveguides has been achieved by laser assisted chemical vapor deposition (LCVD). The multimode waveguides have gaussian-like cross sections, smooth surfaces, and exhibit losses as low as 5.4 dB/cm. The LCVD technique offers the capability of maskless in situ selective epitaxial growth of diverse multilayer structures, and is therefore a novel alternative for the monolithic integration of optoelectronic integrated circuits.

Direct writing of GaAs optical waveguides by laser‐assisted chemical vapor deposition

1996 ◽  
Vol 68 (15) ◽  
pp. 2041-2042 ◽  
Author(s):  
K. S. Boutros ◽  
J. C. Roberts ◽  
S. M. Bedair
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Optical Waveguides ◽  
Chemical Vapor ◽  
Direct Writing
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