Effect of polishing process on silica surface laser-induced damage threshold at 355 nm

2004 ◽  
Vol 242 (1-3) ◽  
pp. 227-231 ◽  
Author(s):  
B. Bertussi ◽  
J.-Y. Natoli ◽  
M. Commandre
Keyword(s):  
Silica Surface ◽  
Damage Threshold ◽  
Polishing Process ◽  
Surface Laser ◽  
Laser Induced Damage

scholarly journals High surface laser-induced damage threshold of SrB4O7 single crystals under 266-nm (DUV) laser irradiation

2020 ◽  
Vol 28 (20) ◽  
pp. 29239
Author(s):  
Yasunori Tanaka ◽  
Ryota Murai ◽  
Yoshinori Takahashi ◽  
Tsuyoshi Sugita ◽  
Daisetsu Toh ◽  
...  
Keyword(s):  
Single Crystals ◽  
Laser Irradiation ◽  
High Surface ◽  
Damage Threshold ◽  
Surface Laser ◽  
Laser Induced Damage

scholarly journals Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1294
Author(s):  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Structural Defects ◽  
Laser Damage ◽  
Material Structure ◽  
Ion Beam Etching ◽  
Damage Resistance ◽  
Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

The Assessment of Subsurface Damage in Ground Optics by Chemical Etching

2016 ◽  
Vol 679 ◽  
pp. 149-153
Author(s):  
Hui Ye ◽  
Wei Yang
Keyword(s):  
Chemical Etching ◽  
Damage Threshold ◽  
Subsurface Damage ◽  
Polishing Process ◽  
Etching Technique ◽  
Optical Elements ◽  
The Past ◽  
Laser Induced Damage ◽  
Grinding And Polishing

Optical subsurface damage (SSD), generated from traditional grinding and polishing process, is prone to lower the laser-induced damage threshold (LIDT) of optical elements. Due to the fact that SSD elimination is on the premise of SSD evaluation, numerous SSD characterizing techniques have been proposed in the past few decades. In this paper, various SSD evaluations based on chemical etching technique are described and compared.

Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings

2015 ◽  
Vol 55 (1) ◽  
pp. 104 ◽  
Author(s):  
Marius Mrohs ◽  
Lars Jensen ◽  
Stefan Günster ◽  
Thimotheus Alig ◽  
Detlev Ristau
Keyword(s):  
Damage Threshold ◽  
Dual Wavelength ◽  
Antireflective Coatings ◽  
Dual Wavelength Laser ◽  
Laser Induced Damage
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