Resistance change in on-chip aluminum interconnects under cyclic thermo-mechanical stress

2019 ◽  
Vol 100-101 ◽  
pp. 113321
Author(s):  
Matthias Ritter ◽  
Martin Pfost
1994 ◽  
Vol 337 ◽  
Author(s):  
A. Scorzoni ◽  
I. De Munari ◽  
H. Stulens

ABSTRACTIn this paper results of recently developed high resolution resistometric electromigration techniques will be described, with particular attention to the behaviour of narrow, near-bamboo metal lines. After a discussion on recent theoretical results published in the literature, a diffusion model correlating mechanical stress and electromigration will be adopted to describe experimental results of relative resistance change both during and after electromigration. The good agreement between experimental data and simulations must not hide that something must still be understood about the physical mechanism leading to resistance changes during electromigration experiments.


1994 ◽  
Vol 337 ◽  
Author(s):  
W. De Ceuninck ◽  
V. D’Haeger ◽  
H. Stulens ◽  
L. De Schepper ◽  
L.M. Stals

ABSTRACTA new method is presented to evaluate the resistance to electromigration (EM) of on-chip interconnects. The method is based on high resolution in-situ electrical measurements. In this way, the electrical resistance is measured with high accuracy during electromigration at high temperature. After careful analysis of the isothermal results, it was found that the metallization can be characterized by one parameter: the rate of resistance change (RRC). It is shown that the RRC is very sensistive to the electromigration performance. The performance level of the different metallizations can easily be detected and can be qualified in a quantitative way. The results are also compared with classic Mean Time To Failure (MTTF) results and it is found that there exists an almost linear relationship between the RRC results and the MTTF results. However, the in-situ technique offers the benifit that a metallization can be characterized on a time scale as short as a few days, which is certainly not the case for the classical techniques.


2015 ◽  
Vol 15 (9) ◽  
pp. 5115-5121 ◽  
Author(s):  
Mario Motz ◽  
Udo Ausserlechner ◽  
Michael Holliber

Author(s):  
Nazmul Islam

As the world becomes increasingly concerned with endocrine disruptor from estrogenic activity, and since the threat of estrogen can be substantially mitigated if detected early, the demand for real-time/on-site detection of estrogen is expanding quickly. However, current technology is expensive, technically complicated and not available for estrogen level determination at the contamination sites. The primary objective of this research is to develop and validate a robust, rapid lab-on-chip for detecting estrogen in environmental water samples. Anti-estrogen antibodies can be layered to the microcantilever (MC) surface through passive adsorption using a dilute solution of antibody. The estrogen in the water will bind/react with antibody, which will result in a strain in the cantilever. The strain of the cantilever can ultimately be measured as a resistance change in the microsystem. MC will be integrated with AC electokinetic to produce a lab-on-a-chip that can concentrate measure and differentiate viable estrogen.


Sign in / Sign up

Export Citation Format

Share Document