Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks
2010 ◽
Vol 50
(12)
◽
pp. 1907-1914
◽
Keyword(s):
Keyword(s):
2015 ◽
Vol 62
(4)
◽
pp. 1550-1557
◽
Keyword(s):
Keyword(s):