Experimental and numerical investigations on delayed short-circuit failure mode of single chip IGBT devices

2007 ◽  
Vol 47 (2-3) ◽  
pp. 422-428 ◽  
Author(s):  
Z. Khatir ◽  
S. Lefebvre ◽  
F. Saint-Eve
Author(s):  
Xiaochuan Deng ◽  
Xu Li ◽  
Xuan Li ◽  
Hao Zhu ◽  
Xiaojie Xu ◽  
...  
Keyword(s):  

2014 ◽  
Vol 536-537 ◽  
pp. 1537-1541
Author(s):  
Juan Xiao

A marine DC uninterruptible power supply is designed. The UPS adopts PIC16C73 single-chip microcomputer to realize the battery management. Both AC power and battery power, the output voltage stability in 23 to 24 v.Via advanced battery management, two sections of charging, equalized charging and floating charging can automatic convert and the DCUPS has many functions of protection, such as over-voltage protection ,under voltage protection and short circuit protection.The actual use on the ship and other occasions showed that the DCUPS is convenient and practical,and is more simple, reliable and longer emergency power supply than the traditional AC-DC uninterruptible power supply management scheme.


2020 ◽  
Vol 114 ◽  
pp. 113804
Author(s):  
Bixuan Wang ◽  
Jingcun Liu ◽  
Wanping Li ◽  
Guogang Zhang ◽  
Yingsan Geng ◽  
...  

2001 ◽  
Vol 714 ◽  
Author(s):  
Lucile Arnaud ◽  
Gérard Tartavel ◽  
Thierry Berger ◽  
François Mondon ◽  
Robert Truche

ABSTRACTThe electromigration performance of copper damascene interconnects has been studied with respect to hillock formation and is compared to void formation failure mode. The metal lines consisted of Chemical Vapor Deposition (CVD) copper deposited on CVD TiN and capped with SiN. SiO2 was used for copper lines insulation and final passivation. Two line widths (0.5 and 3µm) have been characterized. It is shown that higher activation energy values are obtained for void formation failure mode, respectively Ea = 0.86 eV for wide lines (poly-grain microstructure) and Ea =1.04 eV for narrow lines (quasi-bamboo microstructure) than for extrusion failure mode. Failure analysis performed with a Scanning Electron Microscope (SEM) showed that grain boundaries are active diffusion paths in polycrystalline copper lines whereas interface diffusion is believed to be the main diffusion path in narrow lines. Extrusions are shown to occur at the upper interface of copper damascene lines and to extend laterally as a consequence of cracks in dielectric layers and are thus responsible for short circuit between adjacent lines. Implications on extrapolated lifetimes at operating conditions are discussed.


EPE Journal ◽  
1996 ◽  
Vol 6 (2) ◽  
pp. 25-32 ◽  
Author(s):  
F. Calmon ◽  
J.-P. Chante ◽  
A. Sénès ◽  
B. Reymond

2021 ◽  
Vol 61 ◽  
pp. 269-280
Author(s):  
Lishuo Liu ◽  
Xuning Feng ◽  
Christiane Rahe ◽  
Weihan Li ◽  
Languang Lu ◽  
...  

2020 ◽  
Vol 114 ◽  
pp. 113943
Author(s):  
A. Castellazzi ◽  
F. Richardeau ◽  
A. Borghese ◽  
F. Boige ◽  
A. Fayyaz ◽  
...  

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