Processing of photonic crystals in InP membranes by focused ion beam milling and plasma etching

2013 ◽  
Vol 102 ◽  
pp. 25-28 ◽  
Author(s):  
Thomas Kusserow ◽  
Matthias Wulf ◽  
Ricardo Zamora ◽  
Kelash Kanwar ◽  
Hartmut Hillmer
2004 ◽  
Vol 03 (01n02) ◽  
pp. 81-85
Author(s):  
E. Yu. GAVRILIN ◽  
Yu. B. GORBATOV ◽  
V. V. STARKOV ◽  
A. F. VYATKIN

Photonic crystals are the very promising novel materials for micro- and nanophotonics for visible region. To produce photonic crystals for this region of light, artificial structures with characteristic sizes less than 1 μm have to be manufactured. Electrochemical deep anodic etching and plasma etching techniques is normally used to produce such structures in silicon wafers. However, standard way of deep anodic etching realization is not suitable for sub-micrometer porous silicon formation. In the present work combination of the deep anodic etching and focused ion beam techniques is used to produce ordered structure of macropores in silicon.


2006 ◽  
Author(s):  
Wico C. L. Hopman ◽  
René M. de Ridder ◽  
Shankar Selvaraja ◽  
Cazimir G. Bostan ◽  
Vishwas J. Gadgil ◽  
...  

2021 ◽  
pp. 107743
Author(s):  
Sebastian Tacke ◽  
Philipp Erdmann ◽  
Zhexin Wang ◽  
Sven Klumpe ◽  
Michael Grange ◽  
...  

2012 ◽  
Vol 132 (1) ◽  
pp. 99-106
Author(s):  
Ying Dai ◽  
Lei Yang ◽  
Longhai Wang ◽  
Bin Tian ◽  
Lianying Zou ◽  
...  

2008 ◽  
Vol 18 (9) ◽  
pp. 095010 ◽  
Author(s):  
Jing Fu ◽  
Sanjay B Joshi ◽  
Jeffrey M Catchmark

2013 ◽  
Vol 13 (8) ◽  
pp. 5542-5546 ◽  
Author(s):  
Ying Dai ◽  
Lei Yang ◽  
Longhai Wang ◽  
Lianying Zou ◽  
Bin Tian ◽  
...  

2009 ◽  
Vol 233 (1) ◽  
pp. 102-113 ◽  
Author(s):  
D. COOPER ◽  
R. TRUCHE ◽  
A.C. TWITCHETT-HARRISON ◽  
R.E. DUNIN-BORKOWSKI ◽  
P.A. MIDGLEY

2008 ◽  
Vol 85 (3) ◽  
pp. 640-645 ◽  
Author(s):  
Tao Dai ◽  
Xiangning Kang ◽  
Bei Zhang ◽  
Jun Xu ◽  
Kui Bao ◽  
...  

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