Influence of porosity on electrical properties of low-k dielectrics

2012 ◽  
Vol 92 ◽  
pp. 59-61 ◽  
Author(s):  
Els Van Besien ◽  
Marianna Pantouvaki ◽  
Larry Zhao ◽  
David De Roest ◽  
Mikhail R. Baklanov ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Low K

Improvement on Intrinsic Electrical Properties of Low-k Hydrogen Silsesquioxane/Copper Interconnects Employing Deuterium Plasma Treatment

2000 ◽  
Vol 147 (3) ◽  
pp. 1186 ◽  
Author(s):  
Po-Tsun Liu ◽  
Ting-Chang Chang ◽  
Ya-Liang Yang ◽  
Yi-Fang Cheng ◽  
Jae-Kyun Lee ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Plasma Treatment ◽  
Copper Interconnects ◽  
Deuterium Plasma ◽  
Hydrogen Silsesquioxane ◽  
Low K

Studies of the chemical and electrical properties of fullerene and 3-aminopropyltrimethoxysilane based low-k materials

2012 ◽  
Vol 520 (7) ◽  
pp. 2498-2504 ◽  
Author(s):  
Jolanta Klocek ◽  
Karsten Henkel ◽  
Krzysztof Kolanek ◽  
Katarzyna Broczkowska ◽  
Dieter Schmeisser ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Low K

Electrical properties of nanoporous F doped SiO2 low-k thin films prepared by sol-gel method with catalyst HF

2006 ◽  
Vol 13 (3-4) ◽  
pp. 413-417 ◽  
Author(s):  
Zhi-Wei He ◽  
Xue-Qin Liu ◽  
Da-Yin Xu ◽  
Yong-Ping Guo ◽  
Yin-Yue Wang
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sol Gel ◽  
Gel Method ◽  
Sol Gel Method ◽  
Low K

Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films

2016 ◽  
Vol 108 (20) ◽  
pp. 202901 ◽  
Author(s):  
W. Li ◽  
D. Pei ◽  
X. Guo ◽  
M. K. Cheng ◽  
S. Lee ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Ion Implantation ◽  
Mechanical And Electrical Properties ◽  
Cesium Ion ◽  
Low K

The evolution of optical and electrical properties of low-k dielectrics under bias stress

2009 ◽  
Vol 86 (7-9) ◽  
pp. 1891-1893 ◽  
Author(s):  
J.M. Atkin ◽  
E. Cartier ◽  
T.M. Shaw ◽  
J.R. Lloyd ◽  
R.B. Laibowitz ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Optical And Electrical Properties ◽  
Bias Stress ◽  
Low K

Dielectric low-k composite films based on PMMA, PVC and methylsiloxane-silica: Synthesis, characterization and electrical properties

2007 ◽  
Vol 353 (30-31) ◽  
pp. 2878-2888 ◽  
Author(s):  
Sandra Lavina ◽  
Enrico Negro ◽  
Giuseppe Pace ◽  
Silvia Gross ◽  
Giovanni Depaoli ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Composite Films ◽  
Silica Synthesis ◽  
Low K

Improvement of electrical properties of Cu/SiCOH low- k film integrated system by O 2 plasma treatment

2007 ◽  
Vol 16 (2) ◽  
pp. 524-528 ◽  
Author(s):  
Qian Xiao-Mei ◽  
Wei Yong-Xia ◽  
Yu Xiao-Zhu ◽  
Ye Chao ◽  
Ning Zhao-Yuan ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Plasma Treatment ◽  
Integrated System ◽  
Low K

Influence of porosity on electrical properties of low-k dielectrics irradiated with vacuum-ultraviolet radiation

2016 ◽  
Vol 109 (12) ◽  
pp. 122902 ◽  
Author(s):  
F. A. Choudhury ◽  
H. M. Nguyen ◽  
M. R. Baklanov ◽  
J. F. de Marneffe ◽  
W. Li ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Ultraviolet Radiation ◽  
Vacuum Ultraviolet ◽  
Vacuum Ultraviolet Radiation ◽  
Low K

UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(–H) thin films for 45 nm technology node

2011 ◽  
Vol 11 (5) ◽  
pp. S109-S113 ◽  
Author(s):  
Chi Kyu Choi ◽  
Chang Young Kim ◽  
R. Navamathavan ◽  
Heang Seuk Lee ◽  
Jong-Kwan Woo ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Uv Irradiation ◽  
Irradiation Effects ◽  
Technology Node ◽  
Bonding Structure ◽  
Low K
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