Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas

2008 ◽  
Vol 85 (2) ◽  
pp. 300-303 ◽  
Author(s):  
Hyoun Woo Kim ◽  
Jong Woo Lee ◽  
Woon Suk Hwang ◽  
Beom Hoan O ◽  
Seung Gol Lee ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Ferrite Core ◽  
Inductively Coupled ◽  
Coupled Plasmas ◽  
Low K

Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas

2006 ◽  
Vol 506-507 ◽  
pp. 222-224 ◽  
Author(s):  
Hyoun Woo Kim ◽  
Ju Hyun Myung ◽  
Nam Ho Kim ◽  
Han Sup Lee ◽  
Se-Geun Park ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Ferrite Core ◽  
Inductively Coupled ◽  
Coupled Plasmas ◽  
Low K

Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas

Vacuum ◽  
2005 ◽  
Vol 80 (1-3) ◽  
pp. 193-197 ◽  
Author(s):  
Hyoun Woo Kim ◽  
Ju Hyun Myung ◽  
Nam Ho Kim ◽  
Chin Wook Chung ◽  
Wan Jae Park ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Ferrite Core ◽  
Nitrogen Gas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Characterization of Low-k SiCOH Film Etching in Fluorocarbon Inductively Coupled Plasmas

2017 ◽  
Vol 9 (2) ◽  
pp. 174-178
Author(s):  
Haegyu Jang ◽  
Hoonbae Kim ◽  
Sungwoo Lee ◽  
Hyeonseok Moon ◽  
Donggeun Jung ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas ◽  
Low K

scholarly journals Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

2020 ◽  
Vol 128 (8) ◽  
pp. 089901
Author(s):  
Chenhui Qu ◽  
Steven J. Lanham ◽  
Steven C. Shannon ◽  
Sang Ki Nam ◽  
Mark J. Kushner
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Power Matching ◽  
Coupled Plasmas

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

2006 ◽  
Vol 83 (2) ◽  
pp. 328-335 ◽  
Author(s):  
S.W. Na ◽  
M.H. Shin ◽  
Y.M. Chung ◽  
J.G. Han ◽  
S.H. Jeung ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

scholarly journals Nonlinear electromagnetic fields in 0.5 MHz inductively coupled plasmas

2003 ◽  
Vol 10 (4) ◽  
pp. 1146-1151 ◽  
Author(s):  
K. Ostrikov ◽  
E. Tsakadze ◽  
S. Xu ◽  
S. V. Vladimirov ◽  
R. Storer
Keyword(s):  
Electromagnetic Fields ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Inductively Coupled Plasmas

1974 ◽  
Vol 46 (13) ◽  
pp. 1155A-1162A ◽  
Author(s):  
Velmer A. Fassel ◽  
Richard N. Kniseley
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas
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