CMP characteristics and optical property of ITO thin film by using silica slurry with a variety of process parameters

2006 ◽  
Vol 83 (11-12) ◽  
pp. 2213-2217 ◽  
Author(s):  
Gwon-Woo Choi ◽  
Kang-Yeon Lee ◽  
Nam-Hoon Kim ◽  
Jin-Seong Park ◽  
Yong-Jin Seo ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Property ◽  
Process Parameters ◽  
Silica Slurry

Effect of Te addition into As2Se3 thin film: Optical property study by FTIR and XPS

2015 ◽  
Author(s):  
Tribikram Panda ◽  
R. Naik ◽  
S. Chinnaiyah ◽  
R. Ganesan
Keyword(s):  
Thin Film ◽  
Optical Property

Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD

1996 ◽  
Vol 287 (1-2) ◽  
pp. 120-124 ◽  
Author(s):  
Joon Sung Lee ◽  
Han Wook Song ◽  
Won Jong Lee ◽  
Byoung Gon Yu ◽  
Kwangsoo No
Keyword(s):  
Thin Film ◽  
Titanium Dioxide ◽  
Process Parameters

Thermal annealing induced Ag diffusion into GeS thin film: Structural and optical property study

2019 ◽  
Author(s):  
Sidheswar Patel ◽  
A. Aparimita ◽  
C. Sripan ◽  
R. Ganesan ◽  
Ramakanta Naik
Keyword(s):  
Thin Film ◽  
Optical Property ◽  
Thermal Annealing

Preparation of high-oriented molybdenum thin films using DC reactive magnetronsputtering

2017 ◽  
Vol 31 (07) ◽  
pp. 1750059 ◽  
Author(s):  
Zhengguo Shang ◽  
Dongling Li ◽  
She Yin ◽  
Shengqiang Wang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Process Parameters ◽  
Gas Flow ◽  
Lattice Mismatch ◽  
Practical Significance ◽  
Process Time ◽  
Process Conditions ◽  
Influence Of Process Parameters

Since molybdenum (Mo) thin film has been used widely recently, it attracts plenty of attention, like it is a good candidate of back contact material for CuIn[Formula: see text]Ga[Formula: see text]Se[Formula: see text]S[Formula: see text] (CIGSeS) solar cells development; thanks to its more conductive and higher adhesive property. Besides, molybdenum thin film is an ideal material for aluminum nitride (AlN) thin film preparation and attributes to the tiny (−1.0%) lattice mismatch between Mo and AlN. As we know that the quality of Mo thin film is mainly dependent on process conditions, it brings a practical significance to study the influence of process parameters on Mo thin film properties. In this work, various sputtering conditions are employed to explore the feasibility of depositing a layer of molybdenum film with good quality by DC reactive magnetron sputtering. The influence of process parameters such as power, gas flow, substrate temperature and process time on the crystallinity and crystal orientation of Mo thin films is investigated. X-ray diffraction (XRD) measurements and atomic force microscope (AFM) are used to characterize the properties and surface roughness, respectively. According to comparative analysis on the results, process parameters are optimized. The full width at half maximum (FWHM) of the rocking curves of the (110) Mo is decreased to 2.7[Formula: see text], and the (110) Mo peaks reached [Formula: see text] counts. The grain size and the surface roughness have been measured as 20 Å and 3.8 nm, respectively, at 200[Formula: see text]C.

scholarly journals Optical property study of FePt-C nanocomposite thin film for heat-assisted magnetic recording

2013 ◽  
Vol 21 (8) ◽  
pp. 9906 ◽  
Author(s):  
Z. H. Cen ◽  
B. X. Xu ◽  
J. F. Hu ◽  
J. M. Li ◽  
K. M. Cher ◽  
...  
Keyword(s):  
Thin Film ◽  
Optical Property ◽  
Magnetic Recording ◽  
Nanocomposite Thin Film ◽  
Heat Assisted Magnetic Recording
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