Benchmark of a lithography simulation tool for next generation applications

2006 ◽  
Vol 83 (4-9) ◽  
pp. 1142-1147 ◽  
Author(s):  
B. Tollkühn ◽  
M. Uhle ◽  
J. Fuhrmann ◽  
K. Gärtner ◽  
A. Heubner ◽  
...  
Keyword(s):  
Simulation Tool ◽  
Next Generation ◽  
Lithography Simulation

scholarly journals GOLLUM: a next-generation simulation tool for electron, thermal and spin transport

2014 ◽  
Vol 16 (9) ◽  
pp. 093029 ◽  
Author(s):  
J Ferrer ◽  
C J Lambert ◽  
V M García-Suárez ◽  
D Zs Manrique ◽  
D Visontai ◽  
...  
Keyword(s):  
Spin Transport ◽  
Simulation Tool ◽  
Next Generation

Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography

2013 ◽  
Vol 596 ◽  
pp. 101-106
Author(s):  
Akie Nagao ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Target Material ◽  
Initial Energy ◽  
Electron Trajectory ◽  
Simulation Tool ◽  
Backscattering Coefficient ◽  
Lithography Simulation

We have developed a GUI(Graphical User Interface)-based Monte Carlo simulation tool for electron beam lithography. Simulation was executed by changing initial energy, thickness of resist, and target material. We focused on penetration range, backscattering coefficient and spatial distribution of lost energy. Comparison with other theory indicates that our simulation is reliable in the 10-50keV range of the energy of the electron. It seems that backscattering coefficient is strongly affected by the kind of atoms in the target, not initial energy.

1477: Durability of Next Generation Flexible Ureteroscopes: Randomized Prospective Study

2004 ◽  
Vol 171 (4S) ◽  
pp. 389-389
Author(s):  
Manoj Monga ◽  
Ramakrishna Venkatesh ◽  
Sara Best ◽  
Caroline D. Ames ◽  
Courtney Lee ◽  
...  
Keyword(s):  
Prospective Study ◽  
Next Generation ◽  
Flexible Ureteroscopes
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