Polycrystalline silicon thin films prepared by Ni silicide induced crystallization and the dopant effects on the crystallization

Shanglong Peng; Na Feng; Duokai Hu; Deyan He; Chang-Woo Byun; Yong Woo Lee; Seung-Ki Joo

doi:10.1016/j.cap.2012.04.014

Polycrystalline silicon thin films prepared by Ni silicide induced crystallization and the dopant effects on the crystallization

Current Applied Physics ◽

10.1016/j.cap.2012.04.014 ◽

2012 ◽

Vol 12 (6) ◽

pp. 1470-1475 ◽

Cited By ~ 6

Author(s):

Shanglong Peng ◽

Na Feng ◽

Duokai Hu ◽

Deyan He ◽

Chang-Woo Byun ◽

...

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Induced Crystallization

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Polycrystalline silicon thin films by aluminum induced crystallization of amorphous silicon

Applied Surface Science ◽

10.1016/j.apsusc.2012.09.019 ◽

2013 ◽

Vol 264 ◽

pp. 11-16 ◽

Cited By ~ 19

Author(s):

T. Wang ◽

H. Yan ◽

M. Zhang ◽

X. Song ◽

Q. Pan ◽

...

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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Polycrystalline silicon thin films on glass by aluminum-induced crystallization

IEEE Transactions on Electron Devices ◽

10.1109/16.791997 ◽

1999 ◽

Vol 46 (10) ◽

pp. 2062-2068 ◽

Cited By ~ 74

Author(s):

O. Nast ◽

S. Brehme ◽

D.H. Neuhaus ◽

S.R. Wenham

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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Growth of very large grains in polycrystalline silicon thin films by the sequential combination of vapor induced crystallization using AlCl3 and pulsed rapid thermal annealing

Current Applied Physics ◽

10.1016/j.cap.2012.04.010 ◽

2012 ◽

Vol 12 (6) ◽

pp. 1454-1458 ◽

Cited By ~ 5

Author(s):

Kyung Min Ahn ◽

Seung Mo Kang ◽

Byung Tae Ahn

Keyword(s):

Thin Films ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Sequential Combination ◽

Induced Crystallization

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Al-Induced Crystallization of Polycrystalline Silicon Thin Films Based on Solution Method

Acta Physico-Chimica Sinica ◽

10.3866/pku.whxb20080928 ◽

2008 ◽

Vol 24 (09) ◽

pp. 1689-1693

Author(s):

WANG Shuo ◽

◽

LUO Chong ◽

ZHAO Ying ◽

...

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Solution Method ◽

Silicon Thin Films ◽

Induced Crystallization

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Electrochemically Deposited Pd-Induced Crystallization of Parallel Needlelike Polycrystalline Silicon from Prepatterned Amorphous Silicon Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1435562 ◽

2002 ◽

Vol 5 (2) ◽

pp. C31

Author(s):

C. W. Chao ◽

G. R. Hu ◽

Y. S. Wu ◽

Y. C. Chen ◽

M. S. Feng

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Electrochemically Deposited ◽

Induced Crystallization

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In situObservation of Polycrystalline Silicon Thin Films Grown Using Aluminum-Doped Zinc Oxide on Glass Substrate by the Aluminum-Induced Crystallization

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.04dp02 ◽

2011 ◽

Vol 50 (4S) ◽

pp. 04DP02 ◽

Cited By ~ 5

Author(s):

Mina Jung ◽

Atsushi Okada ◽

Takanobu Saito ◽

Takashi Suemasu ◽

Chan-Yeup Chung ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Glass Substrate ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Aluminum Doped Zinc Oxide ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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On the Controlling Mechanism of Preferential Orientation of Polycrystalline-Silicon Thin Films Grown by Aluminum-Induced Crystallization

Applied Physics Express ◽

10.1143/apex.3.095803 ◽

2010 ◽

Vol 3 (9) ◽

pp. 095803 ◽

Cited By ~ 25

Author(s):

Mina Jung ◽

Atsushi Okada ◽

Takanobu Saito ◽

Takashi Suemasu ◽

Noritaka Usami

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Preferential Orientation ◽

Silicon Thin Films ◽

Controlling Mechanism ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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In situObservation of Polycrystalline Silicon Thin Films Grown Using Aluminum-Doped Zinc Oxide on Glass Substrate by the Aluminum-Induced Crystallization

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.04dp02 ◽

2011 ◽

Vol 50 (4) ◽

pp. 04DP02 ◽

Cited By ~ 1

Author(s):

Mina Jung ◽

Atsushi Okada ◽

Takanobu Saito ◽

Takashi Suemasu ◽

Chan-Yeup Chung ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Glass Substrate ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Aluminum Doped Zinc Oxide ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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In-Situ Heating Observation for Formation Behavior of Polycrystalline Silicon Thin Films Fabricated Using Aluminum Induced Crystallization

Journal of the Japan Institute of Metals and Materials ◽

10.2320/jinstmet.71.158 ◽

2007 ◽

Vol 71 (2) ◽

pp. 158-163 ◽

Cited By ~ 1

Author(s):

Ken-ichi Ikeda ◽

Takeshi Hirota ◽

Kensuke Fujimoto ◽

Youhei Sugimoto ◽

Naoki Takata ◽

...

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Formation Behavior ◽

In Situ Heating ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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On the Discontinuity of Polycrystalline Silicon Thin Films Realized by Aluminum-Induced Crystallization of PECVD-Deposited Amorphous Si

Brazilian Journal of Physics ◽

10.1007/s13538-016-0484-6 ◽

2017 ◽

Vol 47 (2) ◽

pp. 145-150

Author(s):

Qingtao Pan ◽

Tao Wang ◽

Hui Yan ◽

Ming Zhang ◽

Yaohua Mai

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Silicon Thin Films ◽

Amorphous Si ◽

Induced Crystallization ◽

Aluminum Induced Crystallization

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