The impact on in-situ-hydrogen-plasma treatment for zinc oxide plasma enhanced atomic layer deposition

2012 ◽  
Vol 12 ◽  
pp. S134-S138 ◽  
Author(s):  
Jung-Dae Kwon ◽  
Jae-Won Lee ◽  
Kee-Seok Nam ◽  
Dong-Ho Kim ◽  
Yongsoo Jeong ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Layer Deposition ◽  
The Impact

Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition

2013 ◽  
Vol 31 (1) ◽  
pp. 01A124 ◽  
Author(s):  
Tae-Hoon Jung ◽  
Jin-Seong Park ◽  
Dong-Ho Kim ◽  
Yongsoo Jeong ◽  
Sung-Gyu Park ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Layer Deposition

Plasma enhanced atomic layer deposition of HfO2 with in situ plasma treatment

2012 ◽  
Vol 93 ◽  
pp. 15-18 ◽  
Author(s):  
Dawei Xu ◽  
Xinhong Cheng ◽  
Youwei Zhang ◽  
Zhongjian Wang ◽  
Chao Xia ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Atomic Layer ◽  
Layer Deposition

Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure

2012 ◽  
Vol 101 (23) ◽  
pp. 231601 ◽  
Author(s):  
Laura B. Ruppalt ◽  
Erin R. Cleveland ◽  
James G. Champlain ◽  
Sharka M. Prokes ◽  
J. Brad Boos ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Plasma Exposure ◽  
Layer Deposition

Improved electrical characteristics high-k gated MOS devices with in-situ remote plasma treatment in atomic layer deposition

2013 ◽  
Vol 109 ◽  
pp. 64-67 ◽  
Author(s):  
Chen-Chien Li ◽  
Kuei-Shu Chang-Liao ◽  
Chung-Hao Fu ◽  
Tsung-Lin Hsieh ◽  
Li-Ting Chen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Remote Plasma ◽  
Mos Devices ◽  
Layer Deposition ◽  
High K
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