Fabrication of gold nano-particle arrays using two-dimensional templates from holographic lithography

2009 ◽  
Vol 9 (4) ◽  
pp. 820-825 ◽  
Author(s):  
Fung Ying Lee ◽  
Kin Hung Fung ◽  
Tsz Leung Tang ◽  
Wing Yim Tam ◽  
C.T. Chan
2005 ◽  
Vol 13 (8) ◽  
pp. 2994 ◽  
Author(s):  
W. D. Mao ◽  
J. W. Dong ◽  
Y. C. Zhong ◽  
G. Q. Liang ◽  
H. Z. Wang

2007 ◽  
Vol 24 (4) ◽  
pp. 983-985 ◽  
Author(s):  
Pu Yi-Ying ◽  
Liang Guan-Quan ◽  
Mao Wei-Dong ◽  
Dong Jian-Wen ◽  
Wang He-Zhou

2007 ◽  
Vol 24 (11) ◽  
pp. 3160-3163 ◽  
Author(s):  
Shen Xiao-Xia ◽  
Yu Xiao-Qiang ◽  
Yang Xiu-Lun ◽  
Cai Lv-Zhong ◽  
Wang Yu-Rong ◽  
...  

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Gaopeng Xue ◽  
Qihang Zhai ◽  
Haiou Lu ◽  
Qian Zhou ◽  
Kai Ni ◽  
...  

AbstractPeriodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd’s mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500–1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.


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