Depth resolved compositional analysis of aluminium oxide thin film using non-destructive soft x-ray reflectivity technique

2017 ◽  
Vol 419 ◽  
pp. 311-318 ◽  
Author(s):  
Mangalika Sinha ◽  
Mohammed H. Modi
Keyword(s):  
Thin Film ◽  
Compositional Analysis ◽  
Aluminium Oxide ◽  
Oxide Thin Film ◽  
X Ray ◽  
Non Destructive

scholarly journals Optoelectronic properties of highly porous silver oxide thin film

2021 ◽  
Vol 3 (1) ◽  
Author(s):  
Ahmad Al-Sarraj ◽  
Khaled M. Saoud ◽  
Abdelaziz Elmel ◽  
Said Mansour ◽  
Yousef Haik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electron Microscope ◽  
Plasma Etching ◽  
Silver Oxide ◽  
Oxidation Time ◽  
Oxide Thin Film ◽  
X Ray ◽  
Porous Silver ◽  
Highly Porous

Abstract In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag2O and AgO NW thin films. The Ag2O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the oxidation time and the plasma application periodicity. Graphic abstract

Investigation of cerium oxide thin film thickness using THz spectroscopy for non-destructive measurement

2020 ◽  
Author(s):  
Subhash Nimanpure ◽  
Guruvandra Singh ◽  
Sudha Yadav ◽  
Preetam Singh ◽  
Girija Moona ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Cerium Oxide ◽  
Oxide Thin Film ◽  
Thz Spectroscopy ◽  
Thin Film Thickness ◽  
Destructive Measurement ◽  
Non Destructive

A valence-selective X-ray fluorescence holography study of an yttrium oxide thin film

2017 ◽  
Vol 50 (6) ◽  
pp. 1583-1589 ◽  
Author(s):  
J. R. Stellhorn ◽  
S. Hosokawa ◽  
N. Happo ◽  
H. Tajiri ◽  
T. Matsushita ◽  
...  
Keyword(s):  
Thin Film ◽  
Absorption Edge ◽  
Structural Information ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Film ◽  
Film Sample ◽  
Epitaxial Thin Film ◽  
X Ray ◽  
Valence States

The first direct valence-selective structure determination by X-ray fluorescence holography is reported. The method is applied to investigate an epitaxial thin film of the rare earth monoxide YO, which has recently been synthesized by pulsed laser deposition. The surface of the sample is easily oxidized to Y2O3. In order to separate the structural information connected with the two different valence states of Y, the X-ray fluorescence holography measurements were performed close to the YKabsorption edge. Using the shift of the absorption edge for the different valence states, very different relative contributions of YO and Y2O3are obtained. Thus, it is possible to distinguish the crystal structures of YO and Y2O3in the thin-film sample.

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