Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate
2016 ◽
Vol 365
◽
pp. 296-305
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Keyword(s):
2008 ◽
Vol 47
(4)
◽
pp. 2848-2853
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2019 ◽
Vol 31
(2)
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pp. 903-909
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Keyword(s):
1995 ◽
Vol 74
(19)
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pp. 3848-3851
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2001 ◽
Vol 19
(4)
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pp. 1742-1746
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Keyword(s):
Endurance improvement due to rapid thermal annealing (RTA) of a TaO x thin film in an oxygen ambient
2015 ◽
Vol 66
(5)
◽
pp. 721-725
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2005 ◽
Vol 244
(1-4)
◽
pp. 444-448
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2009 ◽
Vol 55
(5(1))
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pp. 1925-1930
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Keyword(s):
Keyword(s):