Effect of TiCl4 treatment on the refractive index of nanoporous TiO2 films

2015 ◽  
Vol 357 ◽  
pp. 659-665 ◽  
Author(s):  
Jeeyoung Lee ◽  
Myeongkyu Lee
Keyword(s):  
Refractive Index ◽  
Tio2 Films ◽  
Ticl4 Treatment

Crystallinity of Solution Deposited TiO2 Films

2005 ◽  
Vol 878 ◽  
Author(s):  
Gregory. K. L. Goh
Keyword(s):  
Heat Treatment ◽  
Refractive Index ◽  
Long Range ◽  
Growth Temperature ◽  
Crystalline Lattice ◽  
Tio2 Films ◽  
Titanium Complexes ◽  
Glass Substrates ◽  
Conventional Heat Treatment

AbstractRutile and anatase TiO2 films were grown on glass substrates from acidic titanium precursor solutions from 60°C upwards. Anatase synthesized at 60°C had a crystallinity of 15% that increased to 54% for a growth temperature of 200°C. A similar crystallinity by conventional heat treatment of the 60°C material was attained only at 400°C. It is believed that more complete dehydration of titanium complexes at higher growth temperatures led to less disruption of the long range attractive forces required for the formation of the periodic crystalline lattice. Rutile films grown at 60°C were determined to have a refractive index of 2.4. This is lower than the bulk value of 2.65 because the as-synthesized rutile material was only 29% crystalline and also contained nano-sized pores.

scholarly journals A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Catalysts ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 598 ◽  
Author(s):  
Yu-Hsiang Wang ◽  
Kazi Hasibur Rahman ◽  
Chih-Chao Wu ◽  
Kuan-Chung Chen
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Titanium Dioxide ◽  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
Band Gap ◽  
Vapor Deposition ◽  
Degree Of Crystallinity ◽  
Tio2 Films ◽  
Tio2 Thin Films

Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e., structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg), refractive index (n), transmittance (T), and extinction coefficient (k), of TiO2 films are dependent on the above- mentioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

scholarly journals Improving Carbon-Coated TiO2 Films with a TiCl4 Treatment for Photocatalytic Water Purification

ChemCatChem ◽  
2017 ◽  
Vol 10 (1) ◽  
pp. 234-243 ◽  
Author(s):  
Gylen Odling ◽  
Aruna Ivaturi ◽  
Efthalia Chatzisymeon ◽  
Neil Robertson
Keyword(s):  
Water Purification ◽  
Tio2 Films ◽  
Ticl4 Treatment ◽  
Carbon Coated

Density and refractive index of TiO2 films prepared by reactive evaporation

2000 ◽  
Vol 371 (1-2) ◽  
pp. 218-224 ◽  
Author(s):  
D Mergel ◽  
D Buschendorf ◽  
S Eggert ◽  
R Grammes ◽  
B Samset
Keyword(s):  
Refractive Index ◽  
Tio2 Films ◽  
Reactive Evaporation

Amorphous TiO2 films with high refractive index deposited by pulsed bias arc ion plating

2007 ◽  
Vol 201 (16-17) ◽  
pp. 7252-7258 ◽  
Author(s):  
Min Zhang ◽  
Guoqiang Lin ◽  
Chuang Dong ◽  
Lishi Wen
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Tio2 Films ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Amorphous Tio2

TEM characterization of proton-exchanged LiNbO3 optical waveguides

1986 ◽  
Vol 44 ◽  
pp. 480-481
Author(s):  
W. E. Lee
Keyword(s):  
Refractive Index ◽  
Benzoic Acid ◽  
Optical Waveguides ◽  
Total Internal Reflection ◽  
Index Of Refraction ◽  
Optical Measurements ◽  
Lithium Ions ◽  
Wide Channel ◽  
Tem Characterization

An optical waveguide consists of a several-micron wide channel with a slightly different index of refraction than the host substrate; light can be trapped in the channel by total internal reflection.Optical waveguides can be formed from single-crystal LiNbO3 using the proton exhange technique. In this technique, polished specimens are masked with polycrystal1ine chromium in such a way as to leave 3-13 μm wide channels. These are held in benzoic acid at 249°C for 5 minutes allowing protons to exchange for lithium ions within the channels causing an increase in the refractive index of the channel and creating the waveguide. Unfortunately, optical measurements often reveal a loss in waveguiding ability up to several weeks after exchange.

Light microscopy of ceramics

1993 ◽  
Vol 51 ◽  
pp. 908-909
Author(s):  
Walter C. McCrone
Keyword(s):  
Refractive Index ◽  
Light Microscopy ◽  
Light Microscope ◽  
Polarized Light ◽  
Refractive Indices ◽  
Complete Coverage ◽  
The Subject ◽  
Lower Refractive Index

An excellent chapter on this subject by V.D. Fréchette appeared in a book edited by L.L. Hench and R.W. Gould in 1971 (1). That chapter with the references cited there provides a very complete coverage of the subject. I will add a more complete coverage of an important polarized light microscope (PLM) technique developed more recently (2). Dispersion staining is based on refractive index and its variation with wavelength (dispersion of index). A particle of, say almandite, a garnet, has refractive indices of nF = 1.789 nm, nD = 1.780 nm and nC = 1.775 nm. A Cargille refractive index liquid having nD = 1.780 nm will have nF = 1.810 and nC = 1.768 nm. Almandite grains will disappear in that liquid when observed with a beam of 589 nm light (D-line), but it will have a lower refractive index than that liquid with 486 nm light (F-line), and a higher index than that liquid with 656 nm light (C-line).

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