Glancing angle deposition in a pulsed laser ablation/vapor–liquid–solid grow system

2015 ◽  
Vol 327 ◽  
pp. 262-267 ◽  
Author(s):  
A. Marcu ◽  
F. Stokker ◽  
R.R. Zamani ◽  
C.P. Lungu
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Glancing Angle Deposition ◽  
Vapor Liquid Solid ◽  
Glancing Angle ◽  
Angle Deposition ◽  
Vapor Liquid

scholarly journals Vapor-liquid-solid growth of Ge nanowhiskers enhanced by high-temperature glancing angle deposition

2011 ◽  
Vol 99 (22) ◽  
pp. 223107 ◽  
Author(s):  
Motofumi Suzuki ◽  
Kenji Hamachi ◽  
Hideki Hara ◽  
Kaoru Nakajima ◽  
Kenji Kimura ◽  
...  
Keyword(s):  
High Temperature ◽  
Glancing Angle Deposition ◽  
Vapor Liquid Solid ◽  
Glancing Angle ◽  
Angle Deposition ◽  
Vapor Liquid Solid Growth ◽  
Vapor Liquid

Fabrication of Crystalline Semiconductor Nanowires by Vapor-Liquid-Solid Glancing Angle Deposition (VLS-GLAD) Technique

2011 ◽  
Vol 1350 ◽  
Author(s):  
Arif S. Alagoz ◽  
Tansel Karabacak
Keyword(s):  
Mechanical Properties ◽  
Single Crystal ◽  
Semiconductor Nanowires ◽  
Glancing Angle Deposition ◽  
Nanowire Arrays ◽  
Vapor Liquid Solid ◽  
Crystalline Semiconductor ◽  
Glancing Angle ◽  
Angle Deposition ◽  
Vapor Liquid

ABSTRACTVapor-liquid-solid (VLS) method has become one of the few and most powerful bottom-up single crystal nanowire growth techniques in nanotechnology due to its easy scalability from micro to nano feature sizes, high throughput, relatively low cost, and its applicability to various semiconductor materials. On the other hand, control of growth direction and crystal orientation of nanowires, which determine their electrical, optical, and mechanical properties, stand as major issues in VLS technique. In this study, we demonstrate a new vapor-liquid-solid glancing angle deposition (VLS-GLAD) fabrication approach to produce crystalline semiconductor nanowires with controlled geometry. VLS-GLAD is a physical vapor deposition nanowire fabrication approach based on selective deposition of nanowire source atoms onto metal catalyst nanoislands placed on a crystal wafer. In this technique, collimated obliquely incident flux of source atoms selectively deposit on catalyst islands by using “shadowing effect”. Geometrical showing effect combined with conventional VLS growth mechanism leads to the growth of tilted crystalline semiconductor nanowire arrays. In this study, we report morphological and structural properties of tilted single crystal germanium nanowire arrays fabricated by utilizing a conventional thermal evaporation system. In addition to the tilted geometry, by introducing substrate rotation, nanowires with various morphologies including helical, zig-zag, or vertical shapes can be fabricated. Engineering crystalline nanowire morphology by using VLS-GLAD have the potential of enabling control of optical, electrical, and mechanical properties of these nanostructures leading to the development of novel 3D nano-devices.

Structural Evolution of Nanostructured YBa2Cu3Ox Thin Films Formed by Pulsed Laser Glancing Angle Deposition

2007 ◽  
Vol 121-123 ◽  
pp. 947-950
Author(s):  
H.H. Wang ◽  
Y.P. Zhao
Keyword(s):  
Thin Films ◽  
Laser Fluence ◽  
Pulsed Laser ◽  
Structural Evolution ◽  
Glancing Angle Deposition ◽  
Ambient Oxygen ◽  
Glancing Angle ◽  
Shadowing Effect ◽  
Ambient Gas ◽  
Angle Deposition

Nano-structured thin films of amorphous YBa2Cu3Ox were prepared by pulsed laser glancing angle deposition. Ambient oxygen pressure and laser fluence have a strong effect on the microstructure of the films. The films exhibit a structural evolution from isolated nanorods, through network of vertical nanocolumns, to nanoparticles fractal with increasing ambient oxygen pressures. Shadowing effect, surface diffusion and flux scattering by ambient gas play main roles in determining the structural evolution.

scholarly journals Enhanced thermoelectric properties of SnSe thin films grown by pulsed laser glancing-angle deposition

2017 ◽  
Vol 3 (4) ◽  
pp. 293-298 ◽  
Author(s):  
Chun Hung Suen ◽  
Dongliang Shi ◽  
Y. Su ◽  
Zhi Zhang ◽  
Cheuk Ho Chan ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermoelectric Properties ◽  
Pulsed Laser ◽  
Glancing Angle Deposition ◽  
Glancing Angle ◽  
Angle Deposition

UV activated visible-blind Ga:ZnO photodetectors using the GLAD technique: a comparative study in different gas atmospheres and temperatures

2020 ◽  
Vol 8 (23) ◽  
pp. 7837-7846 ◽  
Author(s):  
Ankit Soni ◽  
Komal Mulchandani ◽  
K. R. Mavani
Keyword(s):  
Comparative Study ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Glancing Angle Deposition ◽  
Laser Deposition ◽  
Glancing Angle ◽  
Deep Uv ◽  
Glad Technique ◽  
Visible Blind ◽  
Angle Deposition

Effects of various gas adsorbates on deep-UV photo-sensing of crystalline and porous ZnO and Ga:ZnO nanostructures produced by Glancing Angle Deposition (GLAD)-assisted pulsed laser deposition (PLD) method.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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