Fabrication, ultra-structure characterization and in vitro studies of RF magnetron sputter deposited nano-hydroxyapatite thin films for biomedical applications

2014 ◽  
Vol 317 ◽  
pp. 172-180 ◽  
Author(s):  
Maria A. Surmeneva ◽  
Roman A. Surmenev ◽  
Yulia A. Nikonova ◽  
Irina I. Selezneva ◽  
Anna A. Ivanova ◽  
...  
Keyword(s):  
Thin Films ◽  
Biomedical Applications ◽  
In Vitro Studies ◽  
Structure Characterization ◽  
Ultra Structure ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited

Effect of oxygen partial pressure in deposition ambient on the properties of RF magnetron sputter deposited Gd_2O_3 thin films

2017 ◽  
Vol 56 (22) ◽  
pp. 6114 ◽  
Author(s):  
S. Maidul Haque ◽  
Rajnarayan De ◽  
S. Tripathi ◽  
C. Mukherjee ◽  
A. K. Yadav ◽  
...  
Keyword(s):  
Thin Films ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Effect Of Oxygen

Rf Magnetron Sputter Deposition and Characterization of Aluminum Nitride thin Films

1986 ◽  
Vol 77 ◽  
Author(s):  
Saluru B. Krupanidhi
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
High Energy ◽  
Axis Orientation ◽  
Deposition Parameters ◽  
Structural And Electrical Properties ◽  
Magnetron Sputter Deposition ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited

ABSTRACTHighly crystalline and resistive thin films of aluminum nitride have been rf magnetron sputter deposited. The films were characterized in terms of structure, electrical and optical properties. A perfect c-axis orientation along (002) direction was obtained, in the reactive sputtered films from a metal target, keeping the substrates as low as 350°C. The structural and electrical properties were observed to be sensitive to deposition conditions. It has also been observed that the combination of higher powers and low sputtering pressures, exposed the films to high energy neutral ion bombardment. A correlation between deposition parameters and the physical properties is presented.

Structural properties of rf magnetron sputter deposited nickel manganate thin films

2005 ◽  
Vol 595 (1-3) ◽  
pp. 239-248 ◽  
Author(s):  
R. Schmidt ◽  
A. Basu ◽  
A.W. Brinkman ◽  
T.P.A. Hase ◽  
Z. Klusek ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Rf Magnetron Sputter ◽  
Magnetron Sputter ◽  
Sputter Deposited
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