Atomic layer deposition and characterization of stoichiometric erbium oxide thin dielectrics on Si(100) using (CpMe)3Er precursor and ozone
2012 ◽
Vol 258
(22)
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pp. 8514-8520
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2010 ◽
Vol 157
(10)
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pp. G193
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2021 ◽
Vol 1762
(1)
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pp. 012041
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2004 ◽
Vol 374
(1-2)
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pp. 124-128
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2003 ◽
Vol 52
(3)
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pp. 289
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2014 ◽
Vol 20
(7-8-9)
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pp. 217-223
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