Influence of oxygen plasma treatment on boron carbon nitride film composition

2009 ◽  
Vol 255 (6) ◽  
pp. 3635-3638 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Takuro Masuzumi ◽  
Daisuke Watanabe ◽  
M.K. Mazumder ◽  
Hiroshi Sota ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Carbon Nitride ◽  
Oxygen Plasma ◽  
Nitride Film ◽  
Oxygen Plasma Treatment ◽  
Film Composition ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Boron carbon nitride film containing hydrogen for 2nm node low-k interconnection

2009 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Takuroh Masuzumi ◽  
Makoto Hara ◽  
Daisuke Watanabe ◽  
Chiharu Kimura ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Low K ◽  
Boron Carbon

Characterization of boron carbon nitride film for humidity sensor

2007 ◽  
Vol 16 (4-7) ◽  
pp. 1300-1303 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Hidekazu Shima ◽  
Chiharu Kimura ◽  
Takashi Sugino
Keyword(s):  
Carbon Nitride ◽  
Humidity Sensor ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Characterization of boron carbon nitride film modified by excimer laser annealing

2007 ◽  
Vol 254 (2) ◽  
pp. 596-599 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Kazutoshi Ohyama ◽  
Hiroshi Sota ◽  
Toshiaki Seino ◽  
Chiharu Kimura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Carbon Nitride ◽  
Laser Annealing ◽  
Nitride Film ◽  
Excimer Laser Annealing ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Electron affinity and field emission characteristics of boron carbon nitride film

2005 ◽  
Vol 14 (3-7) ◽  
pp. 719-723 ◽  
Author(s):  
Chiharu Kimura ◽  
Kunitaka Okada ◽  
Shingo Funakawa ◽  
Shinichiro Sakata ◽  
Takashi Sugino
Keyword(s):  
Field Emission ◽  
Electron Affinity ◽  
Carbon Nitride ◽  
Nitride Film ◽  
Emission Characteristics ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Suppression of Fluorine Diffusion into Methyl Boron Carbon Nitride Film Using Low-Temperature Etching

2010 ◽  
Vol 49 (4) ◽  
pp. 04DB10
Author(s):  
Makoto Hara ◽  
Takuro Masuzumi ◽  
Zhiming Lu ◽  
Chiharu Kimura ◽  
Hidemitsu Aoki ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nitride ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

High Breakdown Voltage GaN HEMT Device Fabricated on Self-Standing GaN Substrate

2013 ◽  
Vol 347-350 ◽  
pp. 1535-1539
Author(s):  
Jian Jun Zhou ◽  
Liang Li ◽  
Hai Yan Lu ◽  
Ceng Kong ◽  
Yue Chan Kong ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Breakdown Voltage ◽  
Oxygen Plasma ◽  
Cutoff Frequency ◽  
Chemical Vapor ◽  
Current Gain ◽  
Organic Chemical ◽  
Oxygen Plasma Treatment ◽  
Gan Hemt ◽  
High Breakdown Voltage

In this letter, a high breakdown voltage GaN HEMT device fabricated on semi-insulating self-standing GaN substrate is presented. High quality AlGaN/GaN epilayer was grown on self-standing GaN substrate by metal organic chemical vapor deposition. A 0.8μm gate length GaN HEMT device was fabricated with oxygen plasma treatment. By using oxygen plasma treatment, gate forward working voltage is increased, and a breakdown voltage of more than 170V is demonstrated. The measured maximum drain current of the device is larger than 700 mA/mm at 4V gate bias voltage. The maximum transconductance of the device is 162 mS/mm. In addition, high frequency performance of the GaN HEMT device is also obtained. The current gain cutoff frequency and power gain cutoff frequency are 19.7 GHz and 32.8 GHz, respectively. A high fT-LG product of 15.76 GHzμm indicating that homoepitaxy technology is helpful to improve the frequency performance of the device.

High‐performance adsorptive desulfurization by ternary hybrid boron carbon nitride aerogel

AIChE Journal ◽  
2021 ◽  
Author(s):  
Jing Luo ◽  
Chao Wang ◽  
Jixing Liu ◽  
Yanchen Wei ◽  
Yanhong Chao ◽  
...  
Keyword(s):  
High Performance ◽  
Carbon Nitride ◽  
Adsorptive Desulfurization ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Tuning boron-carbon-nitride films

Science ◽  
2021 ◽  
Vol 371 (6525) ◽  
pp. 138.6-139
Author(s):  
Phil Szuromi
Keyword(s):  
Carbon Nitride ◽  
Boron Carbon Nitride ◽  
Boron Carbon
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