Influence of oxygen partial pressure on optoelectrical properties of aluminum-doped CdO thin films

R.K. Gupta; K. Ghosh; R. Patel; S.R. Mishra; P.K. Kahol

doi:10.1016/j.apsusc.2008.03.142

Influence of oxygen partial pressure on optoelectrical properties of aluminum-doped CdO thin films

Applied Surface Science ◽

10.1016/j.apsusc.2008.03.142 ◽

2008 ◽

Vol 254 (18) ◽

pp. 5868-5873 ◽

Cited By ~ 12

Author(s):

R.K. Gupta ◽

K. Ghosh ◽

R. Patel ◽

S.R. Mishra ◽

P.K. Kahol

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Cdo Thin Films

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Wide range tuning of electrical conductivity of RF sputtered CdO thin films through oxygen partial pressure variation

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2008.03.024 ◽

2008 ◽

Vol 92 (9) ◽

pp. 1077-1080 ◽

Cited By ~ 34

Author(s):

B. Saha ◽

R. Thapa ◽

K.K. Chattopadhyay

Keyword(s):

Thin Films ◽

Electrical Conductivity ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Pressure Variation ◽

Wide Range ◽

Cdo Thin Films

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Oxygen partial pressure dependence of the structural properties of CdO thin films deposited by a modified reactive vacuum evaporation process

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2003.11.039 ◽

2005 ◽

Vol 89 (2-3) ◽

pp. 205-210 ◽

Cited By ~ 35

Author(s):

F.C. Eze

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Structural Properties ◽

Pressure Dependence ◽

Vacuum Evaporation ◽

Evaporation Process ◽

Cdo Thin Films

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Effect of oxygen partial pressure on structural, optical and electrical properties of titanium-doped CdO thin films

Applied Surface Science ◽

10.1016/j.apsusc.2008.07.102 ◽

2008 ◽

Vol 255 (5) ◽

pp. 2414-2418 ◽

Cited By ~ 33

Author(s):

R.K. Gupta ◽

K. Ghosh ◽

R. Patel ◽

P.K. Kahol

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Optical And Electrical Properties ◽

Effect Of Oxygen ◽

Cdo Thin Films

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Effects of oxygen partial pressure on the crystallographic structure of Mn-Zn ferrite thin films deposited by ion beam sputtering

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90174-0 ◽

1994 ◽

Vol 68-69 ◽

pp. 279-284 ◽

Cited By ~ 3

Author(s):

Hae Seok Cho ◽

Sang Ki Ha ◽

Hyeong Joon Kim

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Ion Beam ◽

Crystallographic Structure ◽

Ion Beam Sputtering ◽

Zn Ferrite ◽

Beam Sputtering ◽

Ferrite Thin Films

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Effects of oxygen partial pressure and substrate temperature on the structure and optical properties of MgxZn1−xO thin films prepared by magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2011.02.076 ◽

2011 ◽

Vol 257 (15) ◽

pp. 6554-6559 ◽

Cited By ~ 5

Author(s):

Xinghua Zhang ◽

Zunming Lu ◽

Fanbin Meng ◽

Yongzhong Wang ◽

Ying Li ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Oxygen Partial Pressure ◽

Partial Pressure

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Impact of oxygen partial pressure on resistive switching characteristics of PLD deposited ZnFe2O4 thin films for RRAM devices

Ceramics International ◽

10.1016/j.ceramint.2021.11.335 ◽

2021 ◽

Author(s):

Senthilkumar Rajarathinan ◽

Udayan Ganguly ◽

Narayanan Venkataramani

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Resistive Switching ◽

Switching Characteristics

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Influence of the Oxygen Partial Pressure on the Opto-Electrical Properties of ZnO Thin Films Deposited by Reactive Evaporation

physica status solidi (b) ◽

10.1002/1521-3951(200007)220:1<293::aid-pssb293>3.0.co;2-l ◽

2000 ◽

Vol 220 (1) ◽

pp. 293-297 ◽

Cited By ~ 6

Author(s):

G. Gordillo ◽

J. Olarte ◽

C. Calderón

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Zno Thin Films ◽

Reactive Evaporation

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Highly conductive AZO thin films obtained by rationally optimizing substrate temperature and oxygen partial pressure

Molecular Crystals and Liquid Crystals ◽

10.1080/15421406.2016.1277484 ◽

2017 ◽

Vol 644 (1) ◽

pp. 190-196 ◽

Cited By ~ 1

Author(s):

Yong Zeng ◽

Zhiqiang Fang ◽

Honglong Ning ◽

Feng Zhu ◽

Xianzhe Liu ◽

...

Keyword(s):

Thin Films ◽

Substrate Temperature ◽

Oxygen Partial Pressure ◽

Partial Pressure

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Behavior of dual ion beam sputtered MgZnO thin films for different oxygen partial pressure

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-013-1644-x ◽

2013 ◽

Vol 25 (2) ◽

pp. 772-777 ◽

Cited By ~ 12

Author(s):

Saurabh Kumar Pandey ◽

Sushil Kumar Pandey ◽

Vishnu Awasthi ◽

Ashish Kumar ◽

M. Gupta ◽

...

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Ion Beam

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Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications

Materials Today Proceedings ◽

10.1016/j.matpr.2021.11.185 ◽

2021 ◽

Author(s):

K Naveen Kumar ◽

Habibuddin Shaik ◽

Amulya Pawar ◽

L.N. Chandrashekar ◽

Sheik Abdul Sattar ◽

...

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Wo3 Thin Films

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