A study on electrical and mechanical properties of hybrid-polymer thin films by a controlled TEOS bubbling ratio

2008 ◽  
Vol 254 (23) ◽  
pp. 7817-7820 ◽  
Author(s):  
S.-J. Cho ◽  
I.-S. Bae ◽  
H.-D. Jeong ◽  
J.-H. Boo
2010 ◽  
Vol 17 (03) ◽  
pp. 353-358 ◽  
Author(s):  
SANG-JIN CHO ◽  
SUNGWOO LEE ◽  
DONGGEUN JUNG ◽  
JIN-HYO BOO

We investigated the interaction of varied plasma power with ultralow-κ Toluene–TEOS hybrid plasma-polymer thin films, as well as changes in electrical and mechanical properties with various mixture ratios of toluene and TEOS (tetraethoxysilane). Using the plasma enhanced chemical vapor deposition (PECVD) method, organic–inorganic hybrid polymer thin films were deposited on silicon(100) substrates under 150°C of wall temperature and a ratio of TEOS to toluene. Toluene and TEOS were utilized as organic and inorganic precursors, and hydrogen and argon were used as bubbler and carrier gases, respectively. In order to compare the differences in the electrical and the mechanical properties of plasma polymerized thin films, we grew the hybrid polymer thin films under 30 W of RF (radio frequency using 13.56 MHz) power with various ratios of toluene to TEOS. The as-grown polymerized thin films were first analyzed by Fourier Transform Infrared (FT-IR) spectroscopy, and Atomic Force Microscopy (AFM). The results of FT-IR showed that the hybrid polymer thin films were totally fragmented and polymerized with increasing RF power. AFM showed that polymer films with smooth surface could be grown under various deposition conditions. An impedance analyzer was utilized for the measurements of capacitance values for dielectric constants and the thin films were analyzed for hardness and Young's modulus using a nanoindenter.


2012 ◽  
Vol 13 (8) ◽  
pp. 1463-1469 ◽  
Author(s):  
Luis Cerdán ◽  
Angel Costela ◽  
Inmaculada García-Moreno

2011 ◽  
Vol 44 (22) ◽  
pp. 9040-9045 ◽  
Author(s):  
Jessica M. Torres ◽  
Chengqing Wang ◽  
E. Bryan Coughlin ◽  
John P. Bishop ◽  
Richard A. Register ◽  
...  

2007 ◽  
Vol 4 (S1) ◽  
pp. S812-S816 ◽  
Author(s):  
In-Seob Bae ◽  
Sang-Jin Cho ◽  
Seong-Hun Jeong ◽  
Hyung Jun Cho ◽  
Byungyou Hong ◽  
...  

2009 ◽  
Vol 55 (5(1)) ◽  
pp. 1780-1784
Author(s):  
Sang-Jin Cho ◽  
In-Seob Bae ◽  
Jin-Hyo Boo ◽  
Sungwoo Lee ◽  
Donggeun Jung

2013 ◽  
Vol 748 ◽  
pp. 165-169 ◽  
Author(s):  
M. Rahmah Siti ◽  
Anika Zafiah M. Rus ◽  
S. Nurulsaidatulsyida ◽  
D.A. Talib ◽  
T.M.Y.S. Tuan Ya

This study reports on the effect of UV-light on the mechanical properties of bio polymer thin films (BPF) doped with 10 % Titanium Dioxide (TiO2). Bio monomer was mixed with 4, 4-methylenebis (phenylisocyanate) (MDI) to produce neat BPF and TiO2 was added to form BPF doped with 10 % TiO2. The film samples were irradiated in UV Accelerated Weatherometer at 50 °C with different exposure time. Universal Testing Machine was used to measure the tensile strength and the fracture surfaces of the tensile specimens were observed by Scanning Electron Microscopy (SEM). The maximum tensile strength of UV irradiated neat BPF is lower than BPF doped with 10 % TiO2 of 3.5 MPa and 4.2 MPa respectively. Stress of neat BPF was decreased from 3.7 MPa to 3.2 MPa after 144 hours of UV exposure at 50 °C while BPF doped with 10 % TiO2 decrease from 4.7 to 3.6 MPa. The Modulus Young of neat BPF is lower than BPF doped with 10 % TiO2 which are 0.32 GPa and 0.33 GPa respectively. The cumulative strain percentage irradiated neat BPF is lower than BPF doped with 10 % TiO2 with 98.7 % and 113.7 % respectively. Unexposed UV light of neat BPF and BPF doped with 10 % TiO2 were observed by SEM shows smooth fracture and brittle fracture respectively. Neat BPF and BPF doped with 10 % TiO2 exposed to UV light show higher ductility property as compared to unexposed BPF. The higher the exposure time of BPF to UV light, revealed systematic increment of tensile strength due to increased crosslink between isocyanate and hydroxyl group.


2005 ◽  
Vol 122 (14) ◽  
pp. 144712 ◽  
Author(s):  
Kenji Yoshimoto ◽  
Tushar S. Jain ◽  
Paul F. Nealey ◽  
Juan J. de Pablo

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