Photocatalytic hydroxyapatite/titanium dioxide multilayer thin film deposited onto glass using an rf magnetron sputtering technique

2007 ◽  
Vol 253 (7) ◽  
pp. 3397-3401 ◽  
Author(s):  
K. Ozeki ◽  
Juliana M. Janurudin ◽  
H. Aoki ◽  
Y. Fukui
Keyword(s):  
Thin Film ◽  
Titanium Dioxide ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Multilayer Thin Film

scholarly journals Optical and Chromaticity Properties of Metal-Dielectric Composite-Based Multilayer Thin-Film Structures Prepared by RF Magnetron Sputtering

Coatings ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 251
Author(s):  
Mohammad Nur-E-Alam ◽  
Md Momtazur Rahman ◽  
Mohammad Khairul Basher ◽  
Mikhail Vasiliev ◽  
Kamal Alameh
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Future Generation ◽  
Rf Magnetron Sputtering ◽  
Building Blocks ◽  
Environmental Stability ◽  
Optical Parameters ◽  
Multilayer Thin Film ◽  
Coated Glass ◽  
Dielectric Composite

Coated glass products, and especially the low-emissivity coatings, have become a common building material used in modern architectural projects. More recently, these material systems became common in specialized glazing systems featuring solar energy harvesting. Apart from achieving the stability of optical parameters in multilayer coatings, it is also important to have improved control over the design of visual color properties of the coated glass. We prepare metal-dielectric composite (MDC)-based multilayer thin-film structures using the radio frequency (RF)-magnetron sputtering deposition and report on their optical and chromaticity properties in comparison with these obtained using pure metal-based Dielectric/Metal/Dielectric (DMD) trilayer structures of similar compositions. Experimentally achieved Hunter L, a, b values of MDC-based multilayer building blocks of coatings provide a new outlook on the engineering of future-generation optical coatings with better color consistency and developing approaches to broaden the range of achievable color coordinates and better environmental stability.

scholarly journals Optical and Chromaticity Properties of Metal-Dielectric Composite-Based Multilayer Thin-Film Structures Prepared by RF Magnetron Sputtering

2020 ◽  
Author(s):  
Mohammad Nur-E Alam ◽  
Md Momtazur Rahman ◽  
Mohammad Khairul Basher ◽  
Mikhail Vasiliev ◽  
Kamal Alameh
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Future Generation ◽  
Rf Magnetron Sputtering ◽  
Building Blocks ◽  
Environmental Stability ◽  
Optical Parameters ◽  
Multilayer Thin Film ◽  
Coated Glass ◽  
Dielectric Composite

Over the last decades, the coated glass products, and especially the low-emissivity coatings have become a common building material used in modern architectural projects. More recently, these material systems became common in specialized glazing systems featuring solar energy harvesting. Apart from achieving the stability of optical parameters in multilayer coatings, it is also important to have improved control over the design of visual color properties of the coated glass. We prepare metal-dielectric composite (MDC) based multilayer thin-film structures using the RF-magnetron sputtering deposition and report on their optical and chromaticity properties in comparison with these obtained using pure metal-based Dielectric/Metal/Dielectric (DMD) trilayer structures of similar compositions. Experimentally achieved Hunter L, a, b values of MDC-based multilayer building blocks of coatings provide a new outlook on the engineering of future-generation optical coatings with better color consistency and developing approaches to broaden the range of achievable color coordinates and better environmental stability.

Effect of Al2O3-doping on the structure and optoelectronic characteristics of MgZnO thin film prepared by RF magnetron sputtering

2021 ◽  
Vol 127 (7) ◽  
Author(s):  
Du-Cheng Tsai ◽  
Feng-Kuan Chen ◽  
Zue-Chin Chang ◽  
Bing-Hau Kuo ◽  
Erh-Chiang Chen ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Al2o3 Doping

Electron Conduction of Nd0.6Sr0.4FeO3−δ Thin Film with Oxygen Vacancies Prepared by RF Magnetron Sputtering

2017 ◽  
Vol 86 (7) ◽  
pp. 074704 ◽  
Author(s):  
Wataru Namiki ◽  
Takashi Tsuchiya ◽  
Makoto Takayanagi ◽  
Shoto Furuichi ◽  
Makoto Minohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Oxygen Vacancies ◽  
Rf Magnetron Sputtering ◽  
Electron Conduction

125MeV Si9+ ion irradiation of calcium phosphate thin film coated by rf-magnetron sputtering technique

2011 ◽  
Vol 257 (6) ◽  
pp. 2134-2141 ◽  
Author(s):  
K. Elayaraja ◽  
M.I. Ahymah Joshy ◽  
R.V. Suganthi ◽  
S. Narayana Kalkura ◽  
M. Palanichamy ◽  
...  
Keyword(s):  
Thin Film ◽  
Calcium Phosphate ◽  
Magnetron Sputtering ◽  
Ion Irradiation ◽  
Rf Magnetron Sputtering

Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering

2003 ◽  
Vol 82 (7) ◽  
pp. 1117-1119 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
G. Nunes
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Transistor ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Film
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