Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Md.Nizam Uddin; Osama A. Fouad; Masaaki Yamazato; Masamitsu Nagano

doi:10.1016/j.apsusc.2004.06.020

Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2004.06.020 ◽

2005 ◽

Vol 240 (1-4) ◽

pp. 120-130 ◽

Cited By ~ 15

Author(s):

Md.Nizam Uddin ◽

Osama A. Fouad ◽

Masaaki Yamazato ◽

Masamitsu Nagano

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor

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Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(00)00571-5 ◽

2000 ◽

Vol 127 (2-3) ◽

pp. 259-264 ◽

Cited By ~ 13

Author(s):

Y.P. Zhang ◽

Y.S. Gu ◽

X.R. Chang ◽

Z.Z. Tian ◽

D.X. Shi ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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The formation and characterization of diamond crystallites by microwave plasma enhanced chemical vapor deposition—a comparison of gaseous and solid carbon sources as precursors

Materials Research Innovations ◽

10.1007/s10019-002-0198-y ◽

2002 ◽

Vol 6 (3) ◽

pp. 122-127 ◽

Cited By ~ 1

Author(s):

Chi-Chao Hung ◽

Chun-Cheng Lin ◽

Han-Chang Shih

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Carbon Sources ◽

Chemical Vapor ◽

Solid Carbon

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Field emission properties of carbon nitride synthesized by microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.12.030 ◽

2019 ◽

Vol 671 ◽

pp. 53-58

Author(s):

Ippei Tanaka ◽

Koudai Yarita ◽

Yukihiro Sakamoto

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Emission Properties ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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The formation and characterization of palladium nanowires in growing carbon nanotubes using microwave plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00966-5 ◽

2003 ◽

Vol 423 (1) ◽

pp. 27-32 ◽

Cited By ~ 26

Author(s):

L.H Chan ◽

K.H Hong ◽

S.H Lai ◽

X.W Liu ◽

H.C Shih

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Palladium Nanowires

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Characterization of Boron Carbonitride (BCN) Thin Films Deposited by Radiofrequency and Microwave Plasma Enhanced Chemical Vapor Deposition

American Journal of Applied Sciences ◽

10.3844/ajassp.2008.736.741 ◽

2008 ◽

Vol 5 (6) ◽

pp. 736-741 ◽

Cited By ~ 13

Author(s):

M.A. Mannan ◽

M. Nagano ◽

K. Shigezumi ◽

T. Kida ◽

N. Hirao ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Boron Carbonitride

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Spectroscopic ellipsometry characterization of nano-crystalline diamond films prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

Thin Solid Films ◽

10.1016/j.tsf.2014.10.071 ◽

2014 ◽

Vol 571 ◽

pp. 230-237 ◽

Cited By ~ 5

Author(s):

J. Mistrik ◽

P. Janicek ◽

A. Taylor ◽

F. Fendrych ◽

L. Fekete ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Linear Antenna ◽

Nano Crystalline ◽

Substrate Temperatures

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Fabrication and Electrochemical Characterization of Carbon Nanosheets by Microwave Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.01ah02 ◽

2012 ◽

Vol 51 (1S) ◽

pp. 01AH02 ◽

Cited By ~ 2

Author(s):

Zhipeng Wang ◽

Mao Shoji ◽

Hironori Ogata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Electrochemical Characterization ◽

Carbon Nanosheets

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Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.10.018 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 124-127 ◽

Cited By ~ 2

Author(s):

Wei-Chun Chen ◽

Wei-Lin Wang ◽

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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