A new method for synthesis of amorphous carbon nitride powders

2000 ◽  
Vol 71 (4) ◽  
pp. 465-467 ◽  
Author(s):  
Y.G. Cao ◽  
X.L. Chen ◽  
Y.C. Lan ◽  
J.Y. Li ◽  
Y.P. Xu ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
New Method ◽  
Amorphous Carbon Nitride

Amorphous Carbon Nitride with Three Coordinate Nitrogen (N3 C ) Vacancies for Exceptional NO x Abatement in Visible Light

2021 ◽  
pp. 2004001
Author(s):  
Youyu Duan ◽  
Yang Wang ◽  
Liyong Gan ◽  
Jiazhi Meng ◽  
Yajie Feng ◽  
...  
Keyword(s):  
Visible Light ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride

X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES ON THE BONDING PROPERTIES OF AMORPHOUS CARBON NITRIDE FILMS SYNTHESIZED BY PULSED LASER DEPOSITION WITH DIFFERENT SUBSTRATE TEMPERATURES

2005 ◽  
Vol 12 (02) ◽  
pp. 185-195
Author(s):  
M. RUSOP ◽  
T. SOGA ◽  
T. JIMBO
Keyword(s):  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Measurement Techniques ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.

Thermodynamic characteristics of the laser evaporation of amorphous carbon nitride

1998 ◽  
Vol 8 (2) ◽  
pp. 73-74
Author(s):  
Sergei I. Kudryashov ◽  
Oleg V. Kravchenko ◽  
Nikita B. Zorov ◽  
Yurii Ya. Kuzyakov
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Thermodynamic Characteristics ◽  
Laser Evaporation ◽  
Amorphous Carbon Nitride

Characterization of hydrogenated amorphous carbon nitride particles and coatings obtained in a CH4/N2 radiofrequency discharge

2005 ◽  
Vol 482 (1-2) ◽  
pp. 226-231 ◽  
Author(s):  
Jérémy Pereira ◽  
Isabelle Géraud-Grenier ◽  
Véronique Massereau-Guilbaud ◽  
André Plain
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Hydrogenated Amorphous Carbon ◽  
Radiofrequency Discharge ◽  
Amorphous Carbon Nitride ◽  
Hydrogenated Amorphous

Reversible photo-induced deformation of amorphous carbon nitride thin films

2014 ◽  
Vol 41 ◽  
pp. 20-24 ◽  
Author(s):  
M. Aono ◽  
T. Harata ◽  
N. Kitazawa ◽  
Y. Watanabe
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride

Effect of substrate temperatures on amorphous carbon nitride films prepared by reactive sputtering

2008 ◽  
Vol 26 (4) ◽  
pp. 966-969 ◽  
Author(s):  
Masami Aono ◽  
Hidenobu Akiyoshi ◽  
Shunsuke Kikuchi ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Reactive Sputtering ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures
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