Effect of substrate temperatures on amorphous carbon nitride films prepared by reactive sputtering

2008 ◽  
Vol 26 (4) ◽  
pp. 966-969 ◽  
Author(s):  
Masami Aono ◽  
Hidenobu Akiyoshi ◽  
Shunsuke Kikuchi ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Reactive Sputtering ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures

X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES ON THE BONDING PROPERTIES OF AMORPHOUS CARBON NITRIDE FILMS SYNTHESIZED BY PULSED LASER DEPOSITION WITH DIFFERENT SUBSTRATE TEMPERATURES

2005 ◽  
Vol 12 (02) ◽  
pp. 185-195
Author(s):  
M. RUSOP ◽  
T. SOGA ◽  
T. JIMBO
Keyword(s):  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Measurement Techniques ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.

Response to visible light in amorphous carbon nitride films prepared by reactive sputtering

2015 ◽  
Vol 55 (1S) ◽  
pp. 01AA03 ◽  
Author(s):  
Masami Aono ◽  
Tomo Harata ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Visible Light ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Reactive Sputtering ◽  
Amorphous Carbon Nitride

Effects of thermal history on the electrical properties of amorphous carbon nitride films prepared by reactive sputtering

2014 ◽  
Vol 53 (11S) ◽  
pp. 11RA09 ◽  
Author(s):  
Naoyuki Tamura ◽  
Masami Aono ◽  
Hiroaki Kishimura ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Electrical Properties ◽  
Amorphous Carbon ◽  
Thermal History ◽  
Carbon Nitride ◽  
Reactive Sputtering ◽  
Amorphous Carbon Nitride

Amorphous Carbon Nitride with Three Coordinate Nitrogen (N3 C ) Vacancies for Exceptional NO x Abatement in Visible Light

2021 ◽  
pp. 2004001
Author(s):  
Youyu Duan ◽  
Yang Wang ◽  
Liyong Gan ◽  
Jiazhi Meng ◽  
Yajie Feng ◽  
...  
Keyword(s):  
Visible Light ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride
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