High pressure DC-magnetron sputtering on liquids: A new process for the production of metal nanosuspensions

2008 ◽  
pp. 78-81 ◽  
Author(s):  
M. Wagener ◽  
B. Günther
Keyword(s):  
High Pressure ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
New Process

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure

Structure and Optical Properties CdS and CdTe Films on Flexible Substrate Obtained by DC Magnetron Sputtering for Solar Cells

2017 ◽  
Vol 9 (5) ◽  
pp. 05035-1-05035-6 ◽  
Author(s):  
G. I. Kopach ◽  
◽  
R. P. Mygushchenko ◽  
G. S. Khrypunov ◽  
A. I. Dobrozhan ◽  
...  
Keyword(s):  
Optical Properties ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Flexible Substrate ◽  
Dc Magnetron Sputtering ◽  
Cdte Films

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno

scholarly journals Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Materials ◽  
2021 ◽  
Vol 14 (10) ◽  
pp. 2508
Author(s):  
Quan Mao ◽  
Meng Liu ◽  
Yajie Li ◽  
Yuquan Wei ◽  
Yong Yang ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
High Light ◽  
Chemical Compositions ◽  
Practical Application ◽  
Dc Magnetron Sputtering ◽  
Optical Absorbance ◽  
Low Efficiency ◽  
Tio2 Phase ◽  
Photocatalytic Tio2

Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Fabrication and properties evaluation of novel Fe46-XCr23Mo14Co7PXB5Si5 (X=0, 6) m metallic glasses deposited by DC magnetron sputtering

2021 ◽  
Vol 131 ◽  
pp. 107120
Author(s):  
Ali Obeydavi ◽  
Ali Shafyei ◽  
Ahmad Rezaeian ◽  
Parviz Kameli ◽  
Jyh-Wei Lee
Keyword(s):  
Magnetron Sputtering ◽  
Metallic Glasses ◽  
Dc Magnetron Sputtering

scholarly journals Surface enhanced fluorescence of Ag nanostructure films prepared by DC magnetron sputtering

2020 ◽  
Author(s):  
V. Atimayulerd ◽  
N. Srisuai ◽  
S. Boonruang ◽  
S. Kalasung ◽  
C. Chananonnawathorn ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Enhanced Fluorescence ◽  
Surface Enhanced Fluorescence ◽  
Surface Enhanced

The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering

Vacuum ◽  
2020 ◽  
Vol 177 ◽  
pp. 109355
Author(s):  
Nils Nedfors ◽  
Daniel Primetzhofer ◽  
Igor Zhirkov ◽  
Justinas Palisaitis ◽  
Per O.Å. Persson ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering
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