Effects of substrate temperatures on the structure and UV-shielding properties of TiO2−CeO2 films deposited on glass by radio-frequency magnetron sputtering

2005 ◽  
Vol 20 (4) ◽  
pp. 7-9 ◽  
Author(s):  
Zhao Qingnan ◽  
Ni Jiamiao ◽  
Zhang Naizhi ◽  
Zhao Xiujian ◽  
Jiang Hong ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Uv Shielding ◽  
Ceo2 Films ◽  
Shielding Properties ◽  
Substrate Temperatures

Wettability, Surface Morphology and Structural Properties of β-FeSi2 Films Manufactured Through Usage of Radio-Frequency Magnetron Sputtering

2020 ◽  
Vol 20 (8) ◽  
pp. 5075-5081
Author(s):  
Peerasil Charoenyuenyao ◽  
Nathaporn Promros ◽  
Rawiwan Chaleawpong ◽  
Nattakorn Borwornpornmetee ◽  
Pattarapol Sittisart ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Film Surface ◽  
Radio Frequency Magnetron ◽  
Root Mean Square Roughness ◽  
Radio Frequency Magnetron Sputtering ◽  
Hydrophobic Property ◽  
Coating Application ◽  
Average Grain Size ◽  
Substrate Temperatures

In this research, β-FeSi2 thin films were manufactured onto Si(111) wafer substrates through the usage of radio-frequency magnetron sputtering (RFMS) method at 2.66 × 10−1 Pa of sputtering pressure. The substrate temperatures were varied at 500 °C, 560 °C, and 600 °C. The Raman lines of the β-FeSi2 fabricated at 500 °C revealed the peaks at the positions of ~174 cm−1, ~189 cm−1, ~199 cm−1, ~243 cm−1, ~278 cm−1, and ~334 cm−1. For the higher substrate temperatures of 560 °C and 600 °C, the Raman peaks of ~189 cm−1, ~243 cm−1, and ~278 cm−1 were shifted toward higher Raman positions. The surface view of the films was observed with several grains over the β-FeSi2 film surface at all substrate temperatures. The average grain size of the films for the samples deposited at 500 °C and 560 °C was in the range of 28 to 30 nm, where the size was enlarged to 36 nm at 600 °C of substrate temperature. The root mean square roughness were 10.19 nm, 10.84 nm, and 13.67 nm for the β-FeSi2 film surface prepared at the substrate temperatures of 500 °C, 560 °C, and 600 °C, respectively. The contact angle (CA) values were 99.25°, 99.80°, and 102.00° for the created samples at 500 °C, 560 °C, and 600 °C, respectively. As the acquired CA values, all β-FeSi2 samples exhibited a hydrophobic property with CA in the range of 90° to 150°. Consequently, the produced β-FeSi2 film surface employing the RFMS method indicated a potential to be employed in a hydrophobic coating application.

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