Thermal stability of sputter-deposited ZnO thin films

1995 ◽  
Vol 24 (2) ◽  
pp. 83-86 ◽  
Author(s):  
Y. Song ◽  
E. S. Kim ◽  
A. Kapila
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Zno Thin Films ◽  
Sputter Deposited ◽  
Thermal Stability Of

scholarly journals Thermal stability of conductive and transparent V-doped ZnO thin films

2014 ◽  
Vol 557 ◽  
pp. 203-206 ◽  
Author(s):  
Hiroshi Chiba ◽  
Tatsuya Mori ◽  
Shuhei Okuda ◽  
Katsuyoshi Washio
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Zno Thin Films ◽  
Doped Zno ◽  
Thermal Stability Of

scholarly journals Thermal stability of sputter-deposited 330 austenitic stainless-steel thin films with nanoscale growth twins

2005 ◽  
Vol 87 (23) ◽  
pp. 233116 ◽  
Author(s):  
X. Zhang ◽  
A. Misra ◽  
H. Wang ◽  
J. G. Swadener ◽  
A. L. Lima ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Stainless Steel ◽  
Austenitic Stainless Steel ◽  
Sputter Deposited ◽  
Thermal Stability Of

Thermal stability of immiscible sputter-deposited Cu-Mo thin films

2019 ◽  
Vol 783 ◽  
pp. 208-218 ◽  
Author(s):  
Imane Souli ◽  
Georg C. Gruber ◽  
Velislava L. Terziyska ◽  
Johannes Zechner ◽  
Christian Mitterer
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Sputter Deposited ◽  
Thermal Stability Of

Thermal Stability of Amorphous Ni-Nb Thin Films for Use as Diffusion Barriers

1987 ◽  
Vol 108 ◽  
Author(s):  
S. N. Farrens ◽  
J. H. Perepezko ◽  
B. L. Doyle ◽  
S. R. Lee
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
X Ray Diffraction ◽  
Free Standing ◽  
X Ray ◽  
Amorphous Thin Films ◽  
Si Substrates ◽  
Sputter Deposited ◽  
Film Substrate ◽  
Thermal Stability Of

ABSTRACTThe interdiffusion and crystallization reactions between amorphous Ni-Nb alloy films and Si substrates and several overlayer metals have been monitored by x-ray diffraction and high resolution Rutherford backscattering spectroscopy. Free standing amorphous thin films of Ni-Nb alloys crystallize in one hour at temperatures between 600–625 °C and show little dependence of the crystallization temperature, Tx, on composition over the range from 30–80 at.% Ni. However, in films that are sputter deposited onto Si substrates Tx tends to increase with increasing Nb composition. Ni60Nb40 samples without overlayers crystallize at 650–700 °C. Enhancement of the thermal stability to 700–750 °C is achieved with a Nb overlayer. In contrast, a Ni overlayer can reduce Tx to 450 °C. At the film/substrate interface silicide formation reactions with Ni from the film contribute to a destabilization of the amorphous alloy. The modification of Tx with Ni, Nb, and other overlayers appears to be related to changes in the reaction kinetics associated with penetration of the overlayer into the film.

scholarly journals The role of the substrate on the mechanical and thermal stability of Pd thin films during hydrogen (de)sorption

2021 ◽  
Vol 46 (5) ◽  
pp. 4137-4153
Author(s):  
Neha Verma ◽  
Rob Delhez ◽  
Niek M. van der Pers ◽  
Frans D. Tichelaar ◽  
Amarante J. Böttger
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Stability Of
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