Resonant electron tunneling in (111) GaAs/AlAs structures

1998 ◽  
Vol 41 (9) ◽  
pp. 943-953
Author(s):  
G. F. Karavaev ◽  
S. N. Grinyaev
2016 ◽  
Vol 42 (11) ◽  
pp. 1090-1093 ◽  
Author(s):  
M. I. Vexler ◽  
G. G. Kareva ◽  
Yu. Yu. Illarionov ◽  
I. V. Grekhov

1996 ◽  
Vol 80 (11) ◽  
pp. 6329-6332 ◽  
Author(s):  
U. Lunz ◽  
M. Keim ◽  
G. Reuscher ◽  
F. Fischer ◽  
K. Schüll ◽  
...  

2014 ◽  
Vol 89 (24) ◽  
Author(s):  
Nikola Pascher ◽  
Flavia Timpu ◽  
Clemens Rössler ◽  
Thomas Ihn ◽  
Klaus Ensslin ◽  
...  

2013 ◽  
Vol 740-742 ◽  
pp. 557-560 ◽  
Author(s):  
Lucian Dragos Filip ◽  
Ioana Pintilie ◽  
Bengt Gunnar Svensson

In this work, anomalous discontinuities observed in Capacitance-Voltage (C-V) characteristics on non-nitridated n-4H-SiC/SiO2 capacitors at low temperature are addressed. The appearance of abrupt capacitance minima, always at the same gate voltages (4V and 8V) and independent on probe frequency, led us to consider a resonant electron tunneling process from neutral donor states present at the SiC/SiO2 interface into two well defined energy levels in the oxide layer. Results of numerical simulations based on this model describe quantitatively the experimentally observed discontinuities at 4V and 8V and provide strong evidence for the presence resonant tunneling.


2006 ◽  
Vol 88 (2) ◽  
pp. 023114 ◽  
Author(s):  
A. Murayama ◽  
T. Asahina ◽  
K. Nishibayashi ◽  
I. Souma ◽  
Y. Oka

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