Precipitation in liquid-quenched Al-Mg alloys; a study using X-ray diffraction line shift and line broadening

1989 ◽  
Vol 24 (10) ◽  
pp. 3779-3786 ◽  
Author(s):  
P. van Mourik ◽  
N. M. Maaswinkel ◽  
Th. H. de Keijser ◽  
E. J. Mittemeijer
2006 ◽  
Vol 54 (3) ◽  
pp. 390-401 ◽  
Author(s):  
Joaquin Bastida ◽  
Marek A. Kojdecki ◽  
Pablo Pardo ◽  
Pedro Amorós

1999 ◽  
Vol 562 ◽  
Author(s):  
U. Welzel ◽  
P. Lamparter ◽  
E. J. Mittemeijer

ABSTRACTInterdiffusion in sputtered niobium(45nm)-tungsten(45nm) bilayers upon annealing at low temperatures (T<1000K) has been investigated using X-ray reflectometry and diffraction. The accompanying changes in macrostress and microstructure have been characterized by applying the X-ray diffraction sin2ψ T method and by qualitative evaluation of the diffraction line broadening, respectively. Annealing causes, besides interdiffusion, changes of macrostress and decrease of microstructural imperfection. Concentration profiles corresponding to diffusion lengths of only a few nanometers were determined by simulation of the measured reflectivity patterns. The values obtained for the diffusion coefficients are compared with corresponding values obtained by extrapolation from published data for bulk materials at much higher temperatures.


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