Domain structure fluctuations kinetics of amorphous alloys at low-temperature annealing

1986 ◽  
Vol 27 (1-4) ◽  
pp. 337-340 ◽  
Author(s):  
V. V. Lomonosov ◽  
V. D. Sedykh ◽  
T. Zemcík
Keyword(s):  
Low Temperature ◽  
Domain Structure ◽  
Amorphous Alloys ◽  
Low Temperature Annealing ◽  
Kinetics Of

Change in the Parameters of Electron-Irradiated 4H-SiC Schottky Diodes as a Function of the Time during Low-Temperature Isothermal Annealing

2019 ◽  
Vol 963 ◽  
pp. 734-737
Author(s):  
Oleg Korolkov ◽  
Vitalii V. Kozlovski ◽  
Alexander A. Lebedev ◽  
Jana Toompuu ◽  
Natalja Sleptsuk ◽  
...  
Keyword(s):  
Low Temperature ◽  
Thermal Cycling ◽  
Liquid Nitrogen ◽  
Isothermal Annealing ◽  
Schottky Diodes ◽  
Rapid Cooling ◽  
Dlts Spectrum ◽  
Low Temperature Annealing ◽  
Kinetics Of ◽  
Dlts Spectra

In the present work, the kinetics of low-temperature annealing (400 °C) of 4H-SiC JBS diodes irradiated by electrons with an energy of 0.9 MeV and with a dose of 1E16 cm-2 was studied. The dynamics of changes in I-V, C-V characteristics, as well as DLTS spectra are shown. In the course of the work, a thermal cycling effect was discovered, i.e., effect of multiple rapid cooling to the temperature of liquid nitrogen and heating of the samples. As a result of thermal cycling, the barrier capacity increases and the on-resistance (Rs) decreases. In the DLTS spectrum, a level of - 0.38 eV appears, absent in the as-irradiated diodes.

Effect of preliminary low-temperature annealing on the kinetics of nucleation

2010 ◽  
Vol 52 (4) ◽  
pp. 821-825 ◽  
Author(s):  
P. M. Valov ◽  
V. I. Leĭman ◽  
M. V. Maksimov ◽  
O. Yu. Derkacheva
Keyword(s):  
Low Temperature ◽  
Low Temperature Annealing ◽  
Kinetics Of

scholarly journals Effect Of Low-Temperature Annealing On The Properties Of Ni-P Amorphous Alloys Deposited Via Electroless Plating

2015 ◽  
Vol 60 (2) ◽  
pp. 865-869 ◽  
Author(s):  
Guanlin Zhao ◽  
Yong Zou ◽  
Hui Zhang ◽  
Zengda Zou
Keyword(s):  
Low Temperature ◽  
Electroless Plating ◽  
Amorphous Alloys ◽  
Cluster Size ◽  
Amorphous Structure ◽  
X Ray Diffraction ◽  
Atomic Pair Distribution Function ◽  
Low Temperature Annealing ◽  
Atomic Pair ◽  
Diffraction Patterns

AbstractAmorphous Ni-P alloys were prepared via electroless plating and annealing at 200°C at different times to obtain different microstructures. The effects of low-temperature annealing on the properties of amorphous Ni-P alloys were studied. The local atomic structure of the annealed amorphous Ni-P alloys was analyzed by calculating the atomic pair distribution function from their X-ray diffraction patterns. The results indicate that the properties of the annealed amorphous Ni-P alloys are closely related to the order atomic cluster size. However, these annealed Ni-P alloys maintained their amorphous structure at different annealing times. The variation in microhardness is in agreement with the change in cluster size. By contrast, the corrosion resistance of the annealed alloys in 3.5 wt% NaCl solution increases with the decrease in order cluster size.

Change of the Magnetic Property in Some Amorphous Alloys by Low Temperature Annealing

1978 ◽  
Vol 17 (1) ◽  
pp. 257-258 ◽  
Author(s):  
Osamu Kohmoto ◽  
Norishige Yamaguchi ◽  
Kazuo Ohya ◽  
Hiroki Fujishima
Keyword(s):  
Magnetic Property ◽  
Low Temperature ◽  
Amorphous Alloys ◽  
Low Temperature Annealing

Low Temperature Annealing of Rh (111) Surfaces

1996 ◽  
Vol 440 ◽  
Author(s):  
Frank Tsui ◽  
Joanne Wellman ◽  
Junhao Xu ◽  
Ctirad Uher ◽  
Roy Clarke
Keyword(s):  
Low Temperature ◽  
Temperature Stability ◽  
High Energy ◽  
Scanning Tunneling ◽  
Initial Surface ◽  
Tunneling Microscopy ◽  
Homoepitaxial Growth ◽  
Low Temperature Annealing ◽  
Kinetics Of

AbstractWe have studied smoothing kinetics of Rh (111) surfaces during low temperature annealing using in-situ real-time reflection high energy electron diffraction and scanning tunneling microscopy. The initial surface features were produced by low temperature homoepitaxial growth of Rh (111). Two types of surfaces were studied, surfaces with two-dimensional (2D) islands at submonolayer coverages, and those with 3D multilayered features. 2D islands coarsen rapidly at the onset of the anneal. 3D features are more stable initially. Their annealing process exhibits a distinct transition from an initial slow coarsening, characterized by a nearly linear growth of lateral size, to a rapid flattening. The activation energy for the transition is ˜ 0.6 eV. The observed behavior indicates that the smoothing kinetics in the low temperature regime is limited by adatom detachment from the step-edges, and that the fast process for the 3D features is made possible by the formation of a network of “chain-like” structures which provide new pathways for diffusion thus overcoming the slow detachment kinetics. These effects determine the low temperature stability of the non-equilibrium epitaxial morphologies.

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