Prediction of the formation of binary metal-metal amorphous alloys by ion implantation

1988 ◽  
Vol 7 (7) ◽  
pp. 681-682 ◽  
Author(s):  
Zhang Bangwei ◽  
Tan Zhaosheng
Keyword(s):  
Ion Implantation ◽  
Amorphous Alloys ◽  
Binary Metal ◽  
Metal Metal

Ion Beam Mixing of Ni-Ti Bilayered Thin Films

1985 ◽  
Vol 43 ◽  
pp. 290-291
Author(s):  
A. K. Rai ◽  
R. S. Bhattacharya ◽  
M. H. Rashid
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Amorphous Alloys ◽  
Ion Beam ◽  
Ion Bombardment ◽  
High Energy ◽  
Mixing Efficiency ◽  
Ion Beam Mixing ◽  
Enhanced Diffusion ◽  
Binary Metal

Ion beam mixing has recently been found to be an effective method of producing amorphous alloys in the binary metal systems where the two original constituent metals are of different crystal structure. The mechanism of ion beam mixing are not well understood yet. Several mechanisms have been proposed to account for the observed mixing phenomena. The first mechanism is enhanced diffusion due to defects created by the incoming ions. Second is the cascade mixing mechanism for which the kinematicel collisional models exist in the literature. Third mechanism is thermal spikes. In the present work we have studied the mixing efficiency and ion beam induced amorphisation of Ni-Ti system under high energy ion bombardment and the results are compared with collisional models. We have employed plan and x-sectional veiw TEM and RBS techniques in the present work.

MAGNETIC PROPERTIES OF METAL-METAL AMORPHOUS ALLOYS

1980 ◽  
Vol 41 (C8) ◽  
pp. C8-686-C8-689 ◽  
Author(s):  
T. Masumoto ◽  
S. Ohnuma ◽  
K. Shirakawa ◽  
M. Nose ◽  
K. Kobayashi
Keyword(s):  
Magnetic Properties ◽  
Amorphous Alloys ◽  
Metal Metal

Formation of metal-metal type aluminum-based amorphous alloys

1988 ◽  
Vol 19 (5) ◽  
pp. 1369-1371 ◽  
Author(s):  
An-Pang Tsai ◽  
Akihisa Inoue ◽  
Tsuyoshi Masumoto
Keyword(s):  
Amorphous Alloys ◽  
Metal Type ◽  
Metal Metal

Tem Study Of Amorphous Alloys Produced By Ion Implantation

1979 ◽  
Vol 116 (1) ◽  
pp. 77-87 ◽  
Author(s):  
E. Johnson ◽  
T. Wohlenberg ◽  
W. A. Grant ◽  
P. Hansen ◽  
L. T. Chadderton
Keyword(s):  
Ion Implantation ◽  
Amorphous Alloys

ELECTRON RADIATION DAMAGE OF SOME METAL-METAL AMORPHOUS ALLOYS

1980 ◽  
Vol 41 (C8) ◽  
pp. C8-854-C8-857 ◽  
Author(s):  
J. Hillairet ◽  
E. Balanzat ◽  
J. Bigot ◽  
H. U. Künzi
Keyword(s):  
Radiation Damage ◽  
Amorphous Alloys ◽  
Electron Radiation ◽  
Metal Metal

Some correlations for diffusion in amorphous alloys

1989 ◽  
Vol 4 (3) ◽  
pp. 603-606 ◽  
Author(s):  
S. K. Sharma ◽  
S. Banerjee ◽  
Kuldeep ◽  
Animesh K. Jain
Keyword(s):  
Activation Energy ◽  
Diffusion Coefficient ◽  
Amorphous Alloys ◽  
Published Data ◽  
Empirical Correlations ◽  
Atomic Size ◽  
Exponential Factor ◽  
Impurity Atoms ◽  
Metal Metal ◽  
Definite Correlation

Diffusion of several impurity atoms (Cu, Al, Au, and Sb) has been studied in Zr61Ni39 and Fe82B18 amorphous alloys. A definite correlation between the diffusion coefficient (D) and the atomic size of the diffusant is seen for the metal-metal (M–M) alloy, while it is not clear for the metal-metalloid (M–Me) alloy. Based on the present data, as well as other published data in binary amorphous alloys, empirical correlations have been found between (i) the activation energy (Q) and the energy required to form a hole of the size of the diffusing atom in the host alloy, and (ii) the pre-exponential factor (D0) and Q. While the former correlation is seen only for binary M–M type of amorphous alloys, the latter correlation is more general and holds for all types of amorphous alloys. Based on the correlation between D0 and Q, it is proposed that there are two distinct mechanisms of diffusion in amorphous alloys.

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