Vacuum lithography?A completely dry lithography using plasma processing

1981 ◽  
Vol 1 (3) ◽  
pp. 261-269 ◽  
Author(s):  
Junji Tamano ◽  
Shuzo Hattori ◽  
Shinzo Morita ◽  
Katsumi Yoneda
Keyword(s):  
Plasma Processing ◽  
Vacuum Lithography

Microstructural characterization of plasma-processed Ti-Al metal matrix composites

1989 ◽  
Vol 47 ◽  
pp. 552-553
Author(s):  
M. G. Burke ◽  
M. N. Gungor ◽  
M. A. Burke
Keyword(s):  
High Temperature ◽  
Titanium Aluminide ◽  
Plasma Processing ◽  
Microstructural Characterization ◽  
High Temperature Strength ◽  
Matrix Composites ◽  
Intermetallic Matrix ◽  
Long Time ◽  
Strength And Stiffness ◽  
Intermetallic Matrix Composites

Intermetallic matrix composites are candidates for ultrahigh temperature service when light weight and high temperature strength and stiffness are required. Recent efforts to produce intermetallic matrix composites have focused on the titanium aluminide (TiAl) system with various ceramic reinforcements. In order to optimize the composition and processing of these composites it is necessary to evaluate the range of structures that can be produced in these materials and to identify the characteristics of the optimum structures. Normally, TiAl materials are difficult to process and, thus, examination of a suitable range of structures would not be feasible. However, plasma processing offers a novel method for producing composites from difficult to process component materials. By melting one or more of the component materials in a plasma and controlling deposition onto a cooled substrate, a range of structures can be produced and the method is highly suited to examining experimental composite systems. Moreover, because plasma processing involves rapid melting and very rapid cooling can be induced in the deposited composite, it is expected that processing method can avoid some of the problems, such as interfacial degradation, that are associated with the relatively long time, high temperature exposures that are induced by conventional processing methods.

Ultrathin Insulator Films with Atomically Smooth Surfaces Using Plasma Processing

2008 ◽  
Author(s):  
Venkateswara Bommisetty ◽  
Rojan L. Karmacharya ◽  
Suravi Shrestha ◽  
David Galipeau
Keyword(s):  
Plasma Processing ◽  
Smooth Surfaces

Controlled Filament Non-Local Discharge (CFND) for Laser Pumping and Plasma Processing

2009 ◽  
Author(s):  
George Miley ◽  
Atanu Khan ◽  
Ben Ulmen ◽  
Guilherme Amadio ◽  
Hugo Leon
Keyword(s):  
Plasma Processing ◽  
Laser Pumping ◽  
Non Local

Plasma Processing of Materials

1985 ◽  
Author(s):  
Merton C. Flemings ◽  
Diran Apelian ◽  
Noel Jarrett ◽  
Bernard H. Kear ◽  
C. Joseph Mogab
Keyword(s):  
Plasma Processing

Use of RF Bias in LAPPS (Large Area Plasma Processing System)

2000 ◽  
Author(s):  
Wallace M. Manheimer ◽  
Martin Lampe ◽  
Richard F. Fernsler
Keyword(s):  
Plasma Processing ◽  
Processing System ◽  
Large Area
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