Multi-element X-ray fluorescence analysis of thin films using a mono-standard calibration procedure

1987 ◽  
Vol 328 (1-2) ◽  
pp. 23-26 ◽  
Author(s):  
P. P. Coetzee
1988 ◽  
Vol 32 ◽  
pp. 105-114 ◽  
Author(s):  
H. Schwenke ◽  
W. Berneike ◽  
J. Knoth ◽  
U. Weisbrod

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.


2020 ◽  
Vol 35 (8) ◽  
pp. 1664-1670
Author(s):  
André Wählisch ◽  
Cornelia Streeck ◽  
Philipp Hönicke ◽  
Burkhard Beckhoff

Reference-free X-ray fluorescence analysis of multilayered, alloyed thin films in the μm regime with significant secondary fluorescence contributions.


1985 ◽  
Vol 29 ◽  
pp. 395-402 ◽  
Author(s):  
T. C. Huang ◽  
W. Parrish

AbstractThe characterization of multi-layer thin films by X-ray fluorescence using the fundamental parameter method and the LAMA-III program is described. Analyses of a double-layer FeMn/NiFe and two triple-layer NiFe/Cu/Cr and Cr/Cu/NiFe specimens show that the complex inter-layer absorption and secondary fluorescence effects were properly corrected. The compositions and thicknesses of all layers agreed to ±2% with corresponding single-layer films, a precisian comparable with bulk and single-layer thin film analyses.


1988 ◽  
Vol 157 (2) ◽  
pp. 325-336 ◽  
Author(s):  
M. Schuster ◽  
L. Müller ◽  
K.E. Mauser ◽  
R. Straub

2019 ◽  
Vol 186 (2-3) ◽  
pp. 268-273
Author(s):  
Radek Prokeš ◽  
Tomáš Trojek

Abstract Confocal micro-beam X-ray fluorescence analysis (confocal micro-XRF) is a non-destructive analytical tool for investigation of sample composition that enables acquiring three-dimensionally resolved information. This work describes a calibration procedure of a laboratory confocal micro-XRF setup, which leads to determination of its characteristic parameters. The calibration is performed using a tabletop confocal micro-XRF spectrometer designed recently at the Czech Technical University in Prague. The calibration procedure performed within this work comprises the essential steps of the setup characterization: excitation spectrum calculation, experimental determination of energy-dependent confocal volume size and integral sensitivity and calculation of the spectrometer sensitivity function. The results of the setup calibration will be used for development of a procedure enabling quantitative evaluation of the measured depth profiles.


Sign in / Sign up

Export Citation Format

Share Document