The technological cycle of spinning Capron cord fibre on the PP-1-1000IR machine

1972 ◽  
Vol 3 (1) ◽  
pp. 50-52
Author(s):  
M. Ya. Gusakov ◽  
L. A. Voedilo ◽  
A. V. Natalushko ◽  
I. N. Maiboroda
1972 ◽  
Vol 3 (1) ◽  
pp. 47-49
Author(s):  
M. Ya. Gusakov ◽  
L. A. Voedilo ◽  
L. I. Gusakova ◽  
I. A. Sviridova ◽  
N. I. Bychkovskii
Keyword(s):  

1972 ◽  
Vol 3 (1) ◽  
pp. 45-46 ◽  
Author(s):  
M. Ya. Gusakov ◽  
I. A. Sviridova ◽  
I. N. Maiboroda

1973 ◽  
Vol 4 (5) ◽  
pp. 565-566
Author(s):  
Kh. Usmanov ◽  
A. Yulchibaev ◽  
T. Sirlibaev ◽  
R. Yusupaliev ◽  
S. Yulchibaeva

1975 ◽  
Vol 6 (4) ◽  
pp. 360-361
Author(s):  
L. V. Kutina ◽  
V. N. Rozhanchuk ◽  
Ya. Ya. Ambainis ◽  
I. T. Nefedova ◽  
L. G. Romanovskaya
Keyword(s):  

1971 ◽  
Vol 2 (1) ◽  
pp. 71-74
Author(s):  
A. B. Smagorinskii ◽  
O. G. Kostyuchenko ◽  
N. M. Taranchuk

2021 ◽  
Vol 1 ◽  
pp. 121-130
Author(s):  
Julija Metic ◽  
Tim C. McAloone ◽  
Daniela C. A. Pigosso

AbstractThis study undertakes a systematic analysis of literature within Circular Economy (CE) in an industrial perspective, with a focus on understanding the consideration of the biological and technological cycles, as well as dual circularity. The paper articulates the key research differences, gaps and trends on the basis of publication evolution, key subject areas, influential journals and keywords co-occurrence mapping. The analysis shows the increasing publication trend with dominance of technological cycle and a wide variety of subject areas incorporated in CE biological, technological and dual cycles. Due to the multidisciplinary and transversal nature of CE, as well as its diverse interpretation and applications, an expansion and consolidation of the subject areas and journals are expected in the years to come. Analysis of co-occurrence on the authors' keywords underlined a limited focus of a business perspective research within the biological cycle, heterogeneous and proactive technological cycle but fragmented research on dual circularity. Further analysis of synergies and limitations is necessary to enhance business effectiveness towards enhanced sustainability.


1975 ◽  
Vol 6 (4) ◽  
pp. 425-428
Author(s):  
E. S. Alekseeva ◽  
Z. V. Vetoshkina ◽  
V. A. Berestnev ◽  
R. V. Uzina

2021 ◽  
Vol 56 ◽  
pp. 97-107
Author(s):  
M. S. Zayats ◽  

A low-temperature (substrate heating temperature up to 400 °C) ion-plasma technology for the formation of nanostructured AlN and BN films by the method of high-frequency reactive magnetron sputtering of the corresponding targets has been developed (the modernized installation "Cathode-1M"), which has in its technological cycle the means of physical and chemical modification, which allow to purposefully control the phase composition, surface morphology, size and texture of nanocrystalline films. The possibility of using the method of high-frequency magnetron sputtering for deposition of transparent hexagonal BN films in the nanoscale state on quartz and silicon substrates is shown. Atomic force microscopy (AFM) has shown that AlN films can have an amorphous or polycrystalline surface with grain sizes of approximately 20-100 nm, with the height of the nanoparticles varying from 3 to 10 nm and the degree of surface roughness from 1 to 10 nm. It was found that the dielectric penetration of polycrystalline AlN films decreases from 10 to 3.5 at increased frequencies from 25 Hz to 1 MHz, and the peak tangent of the dielectric loss angle reaches 0.2 at 10 kHz. Such features indicate the existence of spontaneous polarization of dipoles in the obtained AlN films. Interest in dielectric properties in AlN / Si structures it is also due to the fact that there are point defects, such as nitrogen vacancies and silicon atoms, which diffuse from the silicon substrate during synthesis and play an important role in the dielectric properties of AlN during the formation of dipoles. The technology makes it possible, in a single technological cycle, to produce multilayer structures modified for specific functional tasks with specified characteristics necessary for the manufacture of modern electronics, optoelectronics and sensorics devices. It should also be noted that the technology of magnetron sputtering (installation "Cathode-1M") is highly productive, energetically efficient and environmentally friendly in comparison with other known technologies for creating semiconductor structures and allows them to be obtained with minimal changes in the technological cycle.


1972 ◽  
Vol 2 (6) ◽  
pp. 538-539
Author(s):  
V. I. Khrulev ◽  
G. A. Maksimova ◽  
A. G. Arseenko ◽  
R. G. Ermolaeva ◽  
V. P. Abramenko
Keyword(s):  

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