Determination of boron in high-purity silicon and trichlorosilane indirectly by measurement of cadmium in tris (1,10-phenanthroline) cadmium tetrafluoroborate

1985 ◽  
Vol 320 (1) ◽  
pp. 22-28 ◽  
Author(s):  
C. Y. Liu ◽  
P. Y. Chen ◽  
H. M. Lin ◽  
M. H. Yang
2015 ◽  
Vol 30 (4) ◽  
pp. 909-915 ◽  
Author(s):  
Zheng Wang ◽  
Junye Zhang ◽  
Guoxia Zhang ◽  
Deren Qiu ◽  
Pengyuan Yang

A simple, rapid and reliable method was developed for the determination of trace impurities in high-purity silicon nitride (nm- and μm-sized) by ICP-OES using a slurry nebulization technique.


1985 ◽  
Vol 90 (2) ◽  
pp. 239-245
Author(s):  
P. Y. Chen ◽  
J. S. Chen ◽  
H. J. Sun ◽  
M. H. Yang

1989 ◽  
Vol 22 (8) ◽  
pp. 1961-1967 ◽  
Author(s):  
D. C. Parashar ◽  
A. K. Sarkar ◽  
Niranjan Singh

1968 ◽  
Vol 24 (5) ◽  
pp. 520-523 ◽  
Author(s):  
Ya. Boganch ◽  
P. Kvittner ◽  
E. Sabo

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