The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms

J. P. Dekker; R. Moene; J. Schoonman

doi:10.1007/bf00356018

The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms

Journal of Materials Science ◽

10.1007/bf00356018 ◽

1996 ◽

Vol 31 (11) ◽

pp. 3021-3033 ◽

Cited By ~ 7

Author(s):

J. P. Dekker ◽

R. Moene ◽

J. Schoonman

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Surface Kinetics ◽

Deposition Processes

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Potentials of laser chemical vapour deposition processes in the high temperature corrosion protection of automotive parts

International Congress on Applications of Lasers & Electro-Optics ◽

10.2351/1.5059100 ◽

1996 ◽

Author(s):

J. Pou ◽

P. González ◽

E. García ◽

J. Serra ◽

B. León ◽

...

Keyword(s):

High Temperature ◽

Corrosion Protection ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

High Temperature Corrosion ◽

Automotive Parts ◽

Deposition Processes

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Morphological stability analysis in chemical vapour deposition processes. I

Journal of Crystal Growth ◽

10.1016/0022-0248(78)90395-0 ◽

1978 ◽

Vol 43 (3) ◽

pp. 364-370 ◽

Cited By ~ 42

Author(s):

C.H.J. Van den Brekel ◽

A.K. Jansen

Keyword(s):

Stability Analysis ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Morphological Stability ◽

Deposition Processes

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Deposition of multilayer hard coatings using kinetically controlled chemical vapour deposition processes

Surface and Coatings Technology ◽

10.1016/0257-8972(92)90161-3 ◽

1992 ◽

Vol 54-55 ◽

pp. 193-197 ◽

Cited By ~ 2

Author(s):

K Bartsch

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Hard Coatings ◽

Kinetically Controlled ◽

Deposition Processes

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A scheduling approach for chemical vapour deposition processes in the production of semiconductors

IFAC-PapersOnLine ◽

10.1016/j.ifacol.2019.11.116 ◽

2019 ◽

Vol 52 (13) ◽

pp. 505-510

Author(s):

Massimo Manzini ◽

Marcello Urgo

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Processes

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Automatic modelling of reaction systems using genetic algorithms and its application to chemical vapour deposition processes: advanced utilizations of simulators for chemical systems

Measurement Science and Technology ◽

10.1088/0957-0233/16/1/036 ◽

2004 ◽

Vol 16 (1) ◽

pp. 278-284 ◽

Cited By ~ 10

Author(s):

Takahiro Takahashi ◽

Kimito Funatsu ◽

Yoshinori Ema

Keyword(s):

Genetic Algorithms ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Reaction Systems ◽

Chemical Systems ◽

Deposition Processes

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Theoretical influence of the chemical vapour deposition processes on the thickness and structural uniformity of the deposits

Thin Solid Films ◽

10.1016/0040-6090(83)90148-7 ◽

1983 ◽

Vol 102 (2) ◽

pp. 149-160 ◽

Cited By ~ 11

Author(s):

L. Vandenbulcke

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Processes

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Deposition of multilayer hard coatings using kinetically controlled chemical vapour deposition processes

Surface and Coatings Technology ◽

10.1016/s0257-8972(09)90049-4 ◽

1992 ◽

Vol 54-55 ◽

pp. 193-197 ◽

Cited By ~ 4

Author(s):

K. Bartsch ◽

A. Leonhardt ◽

E. Wolf

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Hard Coatings ◽

Kinetically Controlled ◽

Deposition Processes

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Heterogeneous kinetics and mass transport in chemical vapour deposition processes

Progress in Crystal Growth and Characterization ◽

10.1016/0146-3535(81)90006-x ◽

1981 ◽

Vol 4 (3) ◽

pp. 283-296 ◽

Cited By ~ 10

Author(s):

Michael L. Hitchman ◽

Bernard J. Curtis

Keyword(s):

Mass Transport ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Heterogeneous Kinetics ◽

Deposition Processes

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Chapter 12. Plasma Enhanced Chemical Vapour Deposition Processes

Chemical Vapour Deposition ◽

10.1039/9781847558794-00494 ◽

2008 ◽

pp. 494-534 ◽

Cited By ~ 2

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Processes

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Effect of temperature on the formation of surface layers in plasma-assisted chemical vapour deposition processes carried out in an atmosphere containing Ti(OiC3H7)4 vapours

Journal of Materials Science Letters ◽

10.1007/bf00291455 ◽

1996 ◽

Vol 15 (2) ◽

pp. 159-161 ◽

Cited By ~ 1

Author(s):

J. R. Sobiecki ◽

T. Wierzchon ◽

B. Kułakowska-Pawlak ◽

W. Żyrnicki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Effect Of Temperature ◽

Surface Layers ◽

Deposition Processes

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