Preparation of high J c YBa2Cu3O7?? superconducting thin films by ion beam sputtering deposition

1991 ◽  
Vol 52 (3) ◽  
pp. 203-205
Author(s):  
Congxin Ren ◽  
Guoliang Chen ◽  
Jianmin Chen ◽  
Jie Yang ◽  
Yijie Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Superconducting Thin Films ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

Ion beam sputtering deposition and etching of high Tc YBCO superconducting thin films

Vacuum ◽  
1991 ◽  
Vol 42 (16) ◽  
pp. 1062-1063
Author(s):  
Zhao Xingrong ◽  
Hao Jianhua ◽  
Zhou Fangqiao ◽  
Sun Handong ◽  
Wang Lingjie ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Superconducting Thin Films ◽  
Ion Beam Sputtering ◽  
High Tc ◽  
Sputtering Deposition ◽  
Beam Sputtering

Ion-beam-sputtering deposition and etching of high-T c YBCO superconducting thin films

1991 ◽  
Author(s):  
Xing-Rong Zhao ◽  
Jianhua Hao ◽  
Fang Q. Zhou ◽  
Han-Don Sun ◽  
Lingjie Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Superconducting Thin Films ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

Ion-beam sputtering deposition of CsI thin films

2004 ◽  
Vol 80 (8) ◽  
pp. 1789-1791 ◽  
Author(s):  
M.A. Nitti ◽  
A. Valentini ◽  
G.S. Senesi ◽  
G. Ventruti ◽  
E. Nappi ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

Optimization in fabricating bismuth telluride thin films by ion beam sputtering deposition

2012 ◽  
Vol 520 (16) ◽  
pp. 5245-5248 ◽  
Author(s):  
Z.H. Zheng ◽  
P. Fan ◽  
T.B. Chen ◽  
Z.K. Cai ◽  
P.J. Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Bismuth Telluride ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

A Study on the Process of ZnO Thin Films Prepared by Ion Beam Sputtering

2011 ◽  
Vol 233-235 ◽  
pp. 2399-2402 ◽  
Author(s):  
Shen Jiang Wu ◽  
Wei Shi ◽  
Jun Hong Su ◽  
Wen Qi Wang
Keyword(s):  
Thin Films ◽  
Orthogonal Experiment ◽  
Ion Beam ◽  
Experimental Result ◽  
Zno Thin Films ◽  
Ion Beam Sputtering ◽  
Technological Parameters ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Deposition Technology

Based on the ion beam sputtering deposition technology, we adopted the reactive sputtering deposition method to accomplish the coating on the glass substrata with ZnO thin films. We used the four-factor and three-level L9(34) orthogonal experiment to obtain the best technological parameters of deposited ZnO thin films: discharge voltage 3.5KV, oxygen current capacity 8SCCM, the coil current 8A, the distance between target and substrata 140mm. The purity of the deposited ZnO thin film is 85.77%, and it has the good crystallization in orientation. The experimental results show that research and development of the ion beam sputtering source is advanced and has a good application value, and the ion beam sputtering deposition technology can be used to deposit the preferred orientation thin films with good performance. The findings have provided the experimental result and the beneficial reference for the ion beam sputtering deposition research.

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