Quantitative characterization of individual particle surfaces by fractal analysis of scanning electron microscope images

1994 ◽  
Vol 350 (7-9) ◽  
pp. 440-447 ◽  
Author(s):  
Annick Van Put ◽  
Akos Vertes ◽  
Darek Wegrzynek ◽  
Boris Treiger ◽  
René Van Grieken
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Fractal Analysis ◽  
Individual Particle ◽  
Quantitative Characterization ◽  
Microscope Images ◽  
Scanning Electron

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

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